A. Ermolieff
Impact in
-
- Semiconductor materials and devices
- Silicon Carbide Semiconductor Technologies
- Materials Chemistry top 10%
- Electronic and Structural Properties of Oxides
- Silicon Nanostructures and Photoluminescence
- Diamond and Carbon-based Materials Research
Papers in
-
- Semiconductor materials and devices 25
- Plasma Diagnostics and Applications 5
- Integrated Circuits and Semiconductor Failure Analysis 4
-
- Electron and X-Ray Spectroscopy Techniques 14
- Co-authors
- D. Rouchon (6 shared papers)S. Marthon (18 shared papers)O. Renault (3 shared papers)L.G. Gosset (2 shared papers)Pascal Bernard (3 shared papers)M.N. Séméria (2 shared papers)Y.F. Nicolau (3 shared papers)G. Rolland (2 shared papers)
- Journals
- Surface and Interface Analysis (4 papers)Solid State Communications (3 papers)Thin Solid Films (3 papers)Journal of Applied Physics (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)
- Partner nations
- FranceBrazilSwitzerland
In The Last Decade
A. Ermolieff
37 papers receiving 704 citations
Peers
Comparison fields: 5 of 50
- Electrical and Electronic Engineering 510
- Materials Chemistry 382
- Surfaces, Coatings and Films 52
- Polymers and Plastics 87
- Bioengineering 35
Countries citing papers authored by A. Ermolieff
This map shows the geographic impact of A. Ermolieff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Ermolieff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Ermolieff more than expected).
Fields of papers citing papers by A. Ermolieff
This network shows the impact of papers produced by A. Ermolieff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Ermolieff. The network helps show where A. Ermolieff may publish in the future.
Co-authors
The 25 scholars most cited alongside A. Ermolieff, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 38 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 113 | |
| 2 | 2002 | 102 | |
| 3 | 1990 | 59 | |
| 4 | 2001 | 58 | |
| 5 | 1995 | 45 | |
| 6 | 2002 | 44 | |
| 7 | 1988 | 36 | |
| 8 | 1986 | 34 | |
| 9 | 1985 | 25 | |
| 10 | 1991 | 21 | |
| 11 | 1999 | 21 | |
| 12 | 1999 | 18 | |
| 13 | 1992 | 17 | |
| 14 | 1975 | 15 | |
| 15 | 1991 | 13 | |
| 16 | 1995 | 11 | |
| 17 | 1991 | 11 | |
| 18 | 1991 | 10 | |
| 19 | 1986 | 8 | |
| 20 | 1993 | 8 |
About A. Ermolieff
A. Ermolieff is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Materials Chemistry, Atomic and Molecular Physics, and Optics and Computational Mechanics, having authored 38 papers that have together received 723 indexed citations. Recurring topics across this work include Semiconductor materials and devices (25 papers), Electron and X-Ray Spectroscopy Techniques (14 papers), Ion-surface interactions and analysis (6 papers), Metal and Thin Film Mechanics (5 papers), Silicon Nanostructures and Photoluminescence (5 papers), Plasma Diagnostics and Applications (5 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Semiconductor materials and interfaces (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (510 citations), Materials Chemistry (382 citations), Surfaces, Coatings and Films (52 citations), Polymers and Plastics (87 citations) and Bioengineering (35 citations). A. Ermolieff has collaborated with scholars based in France, Brazil and Switzerland. Frequent co-authors include D. Rouchon, S. Marthon, O. Renault, L.G. Gosset, Pascal Bernard, M.N. Séméria, Y.F. Nicolau, G. Rolland, B. Daudin and F. Martín. Their work appears in journals such as Surface and Interface Analysis, Solid State Communications, Thin Solid Films, Journal of Applied Physics and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.