W. Neff

66 papers receiving 815 citations

Peers

W. Neff
Comparison fields: 5 of 62
  • Radiation 143
  • Surfaces, Coatings and Films 118
  • Nuclear and High Energy Physics 210
  • Structural Biology 20
  • Radiology, Nuclear Medicine and Imaging 264
Replace R. Lebert with:
R. Lebert Germany
R. Ganter Switzerland
A. Hershcovitch United States
Tamio Hara Japan
A. Wrulich Switzerland
William N. Partlo United States
Jinshou Tian China
Hakaru Mizoguchi Japan
P. Michelato Italy
W. Graves United States
W. Neff relative to R. Lebert Germany R. Lebert's profile →
Citations per field
00.5×4.2×
R. Lebert · 1×
Citations per year

Countries citing papers authored by W. Neff

Since Specialization
Citations

This map shows the geographic impact of W. Neff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Neff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Neff more than expected).

Fields of papers citing papers by W. Neff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Neff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Neff. The network helps show where W. Neff may publish in the future.

Co-authors

The 25 scholars most cited alongside W. Neff, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with W. Neff Line = papers co-authored together W. Neff links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 69 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200496
2 199982
3 200265
4 198042
5 199539
6 199733
7 200032
8 199527
9 199626
10 200426
11 199723
12 198022
13 200121
14 200418
15 199516
16 200315
17 198714
18 200113
19 198913
20 199912

About W. Neff

W. Neff is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Nuclear and High Energy Physics, Radiation and Mechanics of Materials, having authored 69 papers that have together received 867 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (19 papers), Advancements in Photolithography Techniques (18 papers), Atomic and Molecular Physics (18 papers), Laser-Plasma Interactions and Diagnostics (17 papers), Advanced X-ray Imaging Techniques (13 papers), Pulsed Power Technology Applications (11 papers), Laser-induced spectroscopy and plasma (11 papers) and Plasma Applications and Diagnostics (10 papers). The work is most often cited by research in Radiation (143 citations), Surfaces, Coatings and Films (118 citations), Nuclear and High Energy Physics (210 citations), Structural Biology (20 citations) and Radiology, Nuclear Medicine and Imaging (264 citations). W. Neff has collaborated with scholars based in Germany, Romania and Finland. Frequent co-authors include R. Lebert, K. Bergmann, M. Heise, Guido Schriever, Peter Muranyi, J. Wunderlich, G. Herziger, H. Krompholz, F. Rühl and A. Engel. Their work appears in journals such as IEEE Transactions on Plasma Science, Microelectronic Engineering, Physics Letters A, Journal of Applied Physics and SAE technical papers on CD-ROM/SAE technical paper series.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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