Thomas H. Baum
Impact in
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- Copper Interconnects and Reliability
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Papers in
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- Semiconductor materials and devices 18
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- Copper Interconnects and Reliability 11
- Co-authors
- Carl E. Larson (9 shared papers)Carol R. Jones (4 shared papers)P. Doppelt (5 shared papers)Paul B. Comita (4 shared papers)Robert L. Jackson (4 shared papers)Chongying Xu (8 shared papers)Arnold L. Rheingold (5 shared papers)Toivo T. Kodas (3 shared papers)
- Journals
- Chemistry of Materials (7 papers)Journal of The Electrochemical Society (5 papers)Applied Physics Letters (4 papers)Inorganic Chemistry (4 papers)Thin Solid Films (2 papers)
- Partner nations
- United StatesGermanyFrance
In The Last Decade
Thomas H. Baum
44 papers receiving 1.0k citations
Peers
Comparison fields: 5 of 52
- Electronic, Optical and Magnetic Materials 370
- Surfaces, Coatings and Films 90
- Catalysis 78
- Electrical and Electronic Engineering 543
- Inorganic Chemistry 127
Countries citing papers authored by Thomas H. Baum
This map shows the geographic impact of Thomas H. Baum's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas H. Baum with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas H. Baum more than expected).
Fields of papers citing papers by Thomas H. Baum
This network shows the impact of papers produced by Thomas H. Baum. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas H. Baum. The network helps show where Thomas H. Baum may publish in the future.
Co-authors
The 25 scholars most cited alongside Thomas H. Baum, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 44 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1991 | 97 | |
| 2 | 1985 | 85 | |
| 3 | 1994 | 70 | |
| 4 | 1989 | 60 | |
| 5 | 1992 | 60 | |
| 6 | 1986 | 54 | |
| 7 | 1987 | 49 | |
| 8 | 1987 | 47 | |
| 9 | 1992 | 47 | |
| 10 | 2009 | 42 | |
| 11 | 1993 | 36 | |
| 12 | 1998 | 35 | |
| 13 | 1996 | 34 | |
| 14 | 1986 | 33 | |
| 15 | 1996 | 26 | |
| 16 | 1987 | 26 | |
| 17 | 1992 | 25 | |
| 18 | 1988 | 20 | |
| 19 | 1999 | 20 | |
| 20 | 2004 | 18 |
About Thomas H. Baum
Thomas H. Baum is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry, Biomedical Engineering and Mechanics of Materials, having authored 44 papers that have together received 1.1k indexed citations. Recurring topics across this work include Semiconductor materials and devices (18 papers), Copper Interconnects and Reliability (11 papers), Laser-induced spectroscopy and plasma (6 papers), Advanced Materials Characterization Techniques (6 papers), Organometallic Complex Synthesis and Catalysis (5 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Metal and Thin Film Mechanics (4 papers) and Ferroelectric and Piezoelectric Materials (4 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (370 citations), Surfaces, Coatings and Films (90 citations), Catalysis (78 citations), Electrical and Electronic Engineering (543 citations) and Inorganic Chemistry (127 citations). Thomas H. Baum has collaborated with scholars based in United States, Germany and France. Frequent co-authors include Carl E. Larson, Carol R. Jones, P. Doppelt, Paul B. Comita, Robert L. Jackson, Chongying Xu, Arnold L. Rheingold, Toivo T. Kodas, Phillip J. Brock and Scott Reynolds. Their work appears in journals such as Chemistry of Materials, Journal of The Electrochemical Society, Applied Physics Letters, Inorganic Chemistry and Thin Solid Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.