Thomas Feudel

647 citations
28 papers · 245 · h-index 8

Impact in

    • Semiconductor materials and devices
    • Silicon and Solar Cell Technologies
    • Integrated Circuits and Semiconductor Failure Analysis
    • Advancements in Semiconductor Devices and Circuit Design
    • Silicon Carbide Semiconductor Technologies
    • Thin-Film Transistor Technologies
    • Ion-surface interactions and analysis

Papers in

    • Semiconductor materials and devices 20
    • Silicon and Solar Cell Technologies 14
    • Advancements in Semiconductor Devices and Circuit Design 14
    • Integrated Circuits and Semiconductor Failure Analysis 10
    • Silicon Carbide Semiconductor Technologies 4
    • Ion-surface interactions and analysis 6

Thomas Feudel

27 papers receiving 229 citations

Peers

Thomas Feudel
Comparison fields: 5 of 21
  • Electrical and Electronic Engineering 232
  • Computational Mechanics 70
  • Atomic and Molecular Physics, and Optics 52
  • Radiation 7
  • Biomedical Engineering 30
Replace W. Rausch with:
W. Rausch United States
A. Budrevich United States
T. Fukai Japan
S. Novak United States
X. Hebras France
S. Kawazu Japan
B. Biasse France
S. Peters Germany
Christoph Zechner Switzerland
P. M. Rousseau United States
Thomas Feudel relative to W. Rausch United States W. Rausch's profile →
Citations per field
00.5×
W. Rausch · 1×
Citations per year

Countries citing papers authored by Thomas Feudel

Since Specialization
Citations

This map shows the geographic impact of Thomas Feudel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas Feudel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas Feudel more than expected).

Fields of papers citing papers by Thomas Feudel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas Feudel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas Feudel. The network helps show where Thomas Feudel may publish in the future.

Co-authors

The 25 scholars most cited alongside Thomas Feudel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Thomas Feudel Line = papers co-authored together Thomas Feudel links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 28 papers — load more, or switch the sort, to bring in the rest.

#Work
1 199754
2 200033
3 200526
4 200724
5 199819
6 200914
7 200011
8
Simulation of RF Noise in MOSFETs Using Different Transport Models
200310
9 20046
10 20046
11 20176
12 20084
13 20024
14 19983
15 20103
16 20183
17 20043
18 20113
19 20112
20 20162

About Thomas Feudel

Thomas Feudel is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Atomic and Molecular Physics, and Optics, Materials Chemistry and Biomedical Engineering, having authored 28 papers that have together received 245 indexed citations. Recurring topics across this work include Semiconductor materials and devices (20 papers), Silicon and Solar Cell Technologies (14 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Ion-surface interactions and analysis (6 papers), Semiconductor materials and interfaces (4 papers), Silicon Carbide Semiconductor Technologies (4 papers) and Electronic and Structural Properties of Oxides (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (232 citations), Computational Mechanics (70 citations), Atomic and Molecular Physics, and Optics (52 citations), Radiation (7 citations) and Biomedical Engineering (30 citations). Thomas Feudel has collaborated with scholars based in Germany, United States and Italy. Frequent co-authors include M. Posselt, Ken Suzuki, Ch. S. N. Murthy, B. Schmidt, Giovanni Mannino, Alessandra Alberti, Wolfgang Fichtner, Μ. Horstmann, Corrado Bongiorno and Andreas Schenk. Their work appears in journals such as Materials Science and Engineering B, Acta Crystallographica Section B Structural Science, Solid-State Electronics, Journal of The Electrochemical Society and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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