Stuart Sieg
Impact in
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- Electron and X-Ray Spectroscopy Techniques
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- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
Papers in
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- Advancements in Photolithography Techniques 13
- Integrated Circuits and Semiconductor Failure Analysis 8
- Advancements in Semiconductor Devices and Circuit Design 5
- Semiconductor materials and devices 4
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- Electron and X-Ray Spectroscopy Techniques 4
- Optical Coatings and Gratings 3
- Co-authors
- Martin Burkhardt (3 shared papers)Nelson Felix (9 shared papers)Scott Halle (3 shared papers)Anthony Lochtefeld (1 shared paper)Richard A. Farrell (2 shared papers)Karen Petrillo (4 shared papers)Luciana Meli (5 shared papers)Hsinyu Tsai (2 shared papers)
- Journals
- Electronics Letters (1 paper)Journal of Photopolymer Science and Technology (1 paper)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (1 paper)ECS Meeting Abstracts (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (4 papers)
- Partner nations
- United StatesGermanyJapan
In The Last Decade
Stuart Sieg
16 papers receiving 46 citations
Peers
Comparison fields: 5 of 18
- Surfaces, Coatings and Films 16
- Electrical and Electronic Engineering 46
- Radiation 5
- Biomedical Engineering 16
- Instrumentation 1
Countries citing papers authored by Stuart Sieg
This map shows the geographic impact of Stuart Sieg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Stuart Sieg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Stuart Sieg more than expected).
Fields of papers citing papers by Stuart Sieg
This network shows the impact of papers produced by Stuart Sieg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Stuart Sieg. The network helps show where Stuart Sieg may publish in the future.
Co-authors
The 25 scholars most cited alongside Stuart Sieg, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2022 | 12 | |
| 2 | 2016 | 10 | |
| 3 | 2008 | 7 | |
| 4 | 2021 | 3 | |
| 5 | 2017 | 3 | |
| 6 | 2022 | 3 | |
| 7 | 2015 | 3 | |
| 8 | 2021 | 3 | |
| 9 | 2023 | 2 | |
| 10 | 2022 | 2 | |
| 11 | 2018 | 1 | |
| 12 | 2025 | 1 | |
| 13 | 2016 | 1 | |
| 14 | 2017 | 1 | |
| 15 | 2020 | 1 | |
| 16 | 2020 | 1 | |
| 17 | 2016 | 1 | |
| 18 | 2022 | 0 | |
| 19 | 2016 | 0 |
About Stuart Sieg
Stuart Sieg is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, having authored 19 papers that have together received 55 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (13 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers), Electron and X-Ray Spectroscopy Techniques (4 papers), Semiconductor materials and devices (4 papers), Optical Coatings and Gratings (3 papers), Industrial Vision Systems and Defect Detection (2 papers) and Nanofabrication and Lithography Techniques (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (16 citations), Electrical and Electronic Engineering (46 citations), Radiation (5 citations), Biomedical Engineering (16 citations) and Instrumentation (1 citation). Stuart Sieg has collaborated with scholars based in United States, Germany and Japan. Frequent co-authors include Martin Burkhardt, Nelson Felix, Scott Halle, Anthony Lochtefeld, Richard A. Farrell, Karen Petrillo, Luciana Meli, Hsinyu Tsai, Zhiyuan Cheng and Michael Guillorn. Their work appears in journals such as Electronics Letters, Journal of Photopolymer Science and Technology, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, ECS Meeting Abstracts and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.