Rolf E. Hummel
Impact in
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- Copper Interconnects and Reliability
- Materials Chemistry top 5%
- Silicon Nanostructures and Photoluminescence
- ZnO doping and properties
Papers in
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- Semiconductor materials and devices 44
- Thin-Film Transistor Technologies 19
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- Silicon Nanostructures and Photoluminescence 41
- Co-authors
- Matthias Ludwig (20 shared papers)Sung-Sik Chang (4 shared papers)Ryan Dehoff (8 shared papers)S.-S. Chang (8 shared papers)R. Jeffrey Smith (4 shared papers)E. D. Verink (5 shared papers)Thierry Dubroca (11 shared papers)Jannis Hack (5 shared papers)
- Journals
- Applied Physics Letters (12 papers)Journal of Applied Physics (8 papers)Thin Solid Films (7 papers)Corrosion Science (7 papers)Journal of Physics and Chemistry of Solids (7 papers)
- Partner nations
- United StatesGermanySouth Korea
In The Last Decade
Rolf E. Hummel
127 papers receiving 2.4k citations
Peers
Comparison fields: 5 of 103
- Electronic, Optical and Magnetic Materials 695
- Materials Chemistry 1.4k
- Electrical and Electronic Engineering 1.4k
- Surfaces, Coatings and Films 120
- Metals and Alloys 40
Countries citing papers authored by Rolf E. Hummel
This map shows the geographic impact of Rolf E. Hummel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Rolf E. Hummel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Rolf E. Hummel more than expected).
Fields of papers citing papers by Rolf E. Hummel
This network shows the impact of papers produced by Rolf E. Hummel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Rolf E. Hummel. The network helps show where Rolf E. Hummel may publish in the future.
Co-authors
The 25 scholars most cited alongside Rolf E. Hummel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 130 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1993 | 298 | |
| 2 | 2011 | 144 | |
| 3 | 1992 | 131 | |
| 4 | 2001 | 97 | |
| 5 | 1975 | 92 | |
| 6 | 1976 | 74 | |
| 7 | 1987 | 60 | |
| 8 | 1972 | 58 | |
| 9 | 1994 | 50 | |
| 10 | 1971 | 50 | |
| 11 | 1993 | 47 | |
| 12 | 1987 | 45 | |
| 13 | 1994 | 44 | |
| 14 | 1981 | 42 | |
| 15 | 2004 | 41 | |
| 16 | 1983 | 41 | |
| 17 | 2000 | 41 | |
| 18 | 2004 | 37 | |
| 19 | 1995 | 36 | |
| 20 | 1997 | 35 |
About Rolf E. Hummel
Rolf E. Hummel is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Biomedical Engineering and Atomic and Molecular Physics, and Optics, having authored 130 papers that have together received 2.6k indexed citations. Recurring topics across this work include Semiconductor materials and devices (44 papers), Silicon Nanostructures and Photoluminescence (41 papers), Copper Interconnects and Reliability (30 papers), Nanowire Synthesis and Applications (19 papers), Thin-Film Transistor Technologies (19 papers), Ion-surface interactions and analysis (13 papers), Semiconductor materials and interfaces (9 papers) and Metal and Thin Film Mechanics (9 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (695 citations), Materials Chemistry (1.4k citations), Electrical and Electronic Engineering (1.4k citations), Surfaces, Coatings and Films (120 citations) and Metals and Alloys (40 citations). Rolf E. Hummel has collaborated with scholars based in United States, Germany and South Korea. Frequent co-authors include Matthias Ludwig, Sung-Sik Chang, Ryan Dehoff, S.-S. Chang, R. Jeffrey Smith, E. D. Verink, Thierry Dubroca, Jannis Hack, John R. Ambrose and Ichiro Yamada. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, Thin Solid Films, Corrosion Science and Journal of Physics and Chemistry of Solids.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.