R. Glang
Impact in
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- Semiconductor materials and devices
- Chalcogenide Semiconductor Thin Films
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- Copper Interconnects and Reliability
Papers in
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- Semiconductor materials and devices 5
- Silicon and Solar Cell Technologies 4
- Thin-Film Transistor Technologies 4
- Electrical and Thermal Properties of Materials 4
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- Semiconductor materials and interfaces 4
- Surface and Thin Film Phenomena 3
- Co-authors
- L. I. Maissel (4 shared papers)Paul P. Budenstein (1 shared paper)W. Patrick (1 shared paper)S. R. Herd (1 shared paper)R. F. Lever (1 shared paper)F. F. Morehead (1 shared paper)Karl Häuffe (1 shared paper)Hans‐Jürgen Engell (1 shared paper)
- Journals
- Journal of The Electrochemical Society (5 papers)Thin Solid Films (2 papers)IBM Journal of Research and Development (1 paper)Review of Scientific Instruments (1 paper)Journal of Applied Physics (1 paper)
- Partner nations
- United StatesUnited Kingdom
In The Last Decade
R. Glang
18 papers receiving 2.2k citations
R. Glang's Hit Papers
Peers
Comparison fields: 5 of 76
- Electrical and Electronic Engineering 1.4k
- Electronic, Optical and Magnetic Materials 436
- Materials Chemistry 1.0k
- Mechanics of Materials 525
- Surfaces, Coatings and Films 134
Countries citing papers authored by R. Glang
This map shows the geographic impact of R. Glang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Glang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Glang more than expected).
Fields of papers citing papers by R. Glang
This network shows the impact of papers produced by R. Glang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Glang. The network helps show where R. Glang may publish in the future.
Co-authors
The 9 scholars most cited alongside R. Glang, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | Handbook of Thin Film Technology Hit paper breakdown → | 1971 | 2042 |
| 2 | 1965 | 111 | |
| 3 | 1963 | 58 | |
| 4 | 1967 | 54 | |
| 5 | 1991 | 40 | |
| 6 | 1988 | 31 | |
| 7 | 1966 | 18 | |
| 8 | 1965 | 15 | |
| 9 | 1952 | 12 | |
| 10 | 1965 | 10 | |
| 11 | 1967 | 8 | |
| 12 | Handbook of thin film technology | 1970 | 5 |
| 13 | 1968 | 5 | |
| 14 | 1960 | 5 | |
| 15 | 1960 | 4 | |
| 16 | 1969 | 3 | |
| 17 | 1960 | 3 | |
| 18 | 1966 | 2 | |
| 19 | 1990 | 2 | |
| 20 | VAPOR PHASE GROWTH OF SILICON. | 1961 | 1 |
About R. Glang
R. Glang is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Biomedical Engineering and Organic Chemistry, having authored 20 papers that have together received 2.4k indexed citations. Recurring topics across this work include Semiconductor materials and devices (5 papers), Silicon and Solar Cell Technologies (4 papers), Semiconductor materials and interfaces (4 papers), Thin-Film Transistor Technologies (4 papers), Electrical and Thermal Properties of Materials (4 papers), Copper Interconnects and Reliability (4 papers), Surface and Thin Film Phenomena (3 papers) and Advanced Sensor Technologies Research (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.4k citations), Electronic, Optical and Magnetic Materials (436 citations), Materials Chemistry (1.0k citations), Mechanics of Materials (525 citations) and Surfaces, Coatings and Films (134 citations). R. Glang has collaborated with scholars based in United States and United Kingdom. Frequent co-authors include L. I. Maissel, Paul P. Budenstein, W. Patrick, S. R. Herd, R. F. Lever, F. F. Morehead, Karl Häuffe, Hans‐Jürgen Engell and Philipp Schaible. Their work appears in journals such as Journal of The Electrochemical Society, Thin Solid Films, IBM Journal of Research and Development, Review of Scientific Instruments and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.