R. Flitsch
Impact in
- Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
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- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Thin-Film Transistor Technologies
- Silicon and Solar Cell Technologies
Papers in
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- Semiconductor materials and devices 5
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- Silicon Nanostructures and Photoluminescence 2
- Diamond and Carbon-based Materials Research 2
- Silicone and Siloxane Chemistry 2
- Co-authors
- S. I. Raider (8 shared papers)J. A. Aboaf (1 shared paper)W. A. Pliskin (1 shared paper)Da‐Yuan Shih (2 shared papers)S. Nunes (2 shared papers)N. Klymko (2 shared papers)J. Paraszczak (2 shared papers)L. V. Gregor (1 shared paper)
- Journals
- Journal of The Electrochemical Society (5 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)IBM Journal of Research and Development (1 paper)Journal of Adhesion Science and Technology (1 paper)Journal of Vacuum Science and Technology (3 papers)
- Partner nations
- United States
In The Last Decade
R. Flitsch
14 papers receiving 942 citations
Peers
Comparison fields: 5 of 46
- Surfaces, Coatings and Films 293
- Electrical and Electronic Engineering 713
- Structural Biology 16
- Ceramics and Composites 64
- Materials Chemistry 401
Countries citing papers authored by R. Flitsch
This map shows the geographic impact of R. Flitsch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Flitsch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Flitsch more than expected).
Fields of papers citing papers by R. Flitsch
This network shows the impact of papers produced by R. Flitsch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Flitsch. The network helps show where R. Flitsch may publish in the future.
Co-authors
The 13 scholars most cited alongside R. Flitsch, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1975 | 235 | |
| 2 | 1976 | 213 | |
| 3 | 1975 | 161 | |
| 4 | 1978 | 90 | |
| 5 | 1990 | 59 | |
| 6 | 1991 | 45 | |
| 7 | 1976 | 45 | |
| 8 | 1976 | 42 | |
| 9 | 1989 | 37 | |
| 10 | 1973 | 25 | |
| 11 | 1996 | 18 | |
| 12 | 1977 | 12 | |
| 13 | 1971 | 9 | |
| 14 | Preparation of NBS copper-base spectrochemical standards | 1964 | 1 |
About R. Flitsch
R. Flitsch is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Polymers and Plastics, Electronic, Optical and Magnetic Materials and Surfaces, Coatings and Films, having authored 14 papers that have together received 992 indexed citations. Recurring topics across this work include Semiconductor materials and devices (5 papers), Ga2O3 and related materials (4 papers), Electron and X-Ray Spectroscopy Techniques (3 papers), Synthesis and properties of polymers (3 papers), Silicon Nanostructures and Photoluminescence (2 papers), Metal and Thin Film Mechanics (2 papers), Diamond and Carbon-based Materials Research (2 papers) and Silicone and Siloxane Chemistry (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (293 citations), Electrical and Electronic Engineering (713 citations), Structural Biology (16 citations), Ceramics and Composites (64 citations) and Materials Chemistry (401 citations). R. Flitsch has collaborated with scholars based in United States. Frequent co-authors include S. I. Raider, J. A. Aboaf, W. A. Pliskin, Da‐Yuan Shih, S. Nunes, N. Klymko, J. Paraszczak, L. V. Gregor, J. K. Howard and John E. Lewis. Their work appears in journals such as Journal of The Electrochemical Society, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, IBM Journal of Research and Development, Journal of Adhesion Science and Technology and Journal of Vacuum Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.