Michael Vergöhl

58 papers receiving 904 citations

Peers

Michael Vergöhl
Comparison fields: 5 of 66
  • Surfaces, Coatings and Films 107
  • Mechanics of Materials 339
  • Materials Chemistry 544
  • Electrical and Electronic Engineering 462
  • Computational Mechanics 137
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Seunghee Han South Korea
Pavel Baroch Czechia
J. Szczyrbowski Germany
Thorsten Staedler Germany
James A. Ruud United States
Stanislav Haviar Czechia
J.L. Andújar Spain
Jinlong Liu China
Ralf Bandorf Germany
Liangxian Chen China
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Citations per field
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Citations per year

Countries citing papers authored by Michael Vergöhl

Since Specialization
Citations

This map shows the geographic impact of Michael Vergöhl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael Vergöhl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael Vergöhl more than expected).

Fields of papers citing papers by Michael Vergöhl

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael Vergöhl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael Vergöhl. The network helps show where Michael Vergöhl may publish in the future.

Co-authors

The 25 scholars most cited alongside Michael Vergöhl, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Michael Vergöhl Line = papers co-authored together Michael Vergöhl links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 69 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2010318
2 200158
3 201554
4 201344
5 199941
6 200130
7 200621
8 201521
9 201619
10 200119
11 201517
12 200116
13 200014
14 200814
15 200513
16 201513
17 200012
18 201312
19 201111
20 201111

About Michael Vergöhl

Michael Vergöhl is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Materials Chemistry, Computational Mechanics and Surfaces, Coatings and Films, having authored 69 papers that have together received 930 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (29 papers), Surface Roughness and Optical Measurements (21 papers), Optical Coatings and Gratings (19 papers), Diamond and Carbon-based Materials Research (17 papers), Semiconductor materials and devices (14 papers), ZnO doping and properties (7 papers), High-Temperature Coating Behaviors (6 papers) and Plasma Diagnostics and Applications (6 papers). The work is most often cited by research in Surfaces, Coatings and Films (107 citations), Mechanics of Materials (339 citations), Materials Chemistry (544 citations), Electrical and Electronic Engineering (462 citations) and Computational Mechanics (137 citations). Michael Vergöhl has collaborated with scholars based in Germany, Netherlands and Brazil. Frequent co-authors include Bernd Szyszka, Ralf Bandorf, Th. Matthée, V. Sittinger, F.B. Klose, H. Neuhäuser, Andreas Pflug, Thorsten Staedler, Thomas A. Neubert and J. Schoenes. Their work appears in journals such as Thin Solid Films, Surface and Coatings Technology, Applied Optics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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