Michael D. Fleischauer

2.7k citations
59 papers · 2.4k · 1 hit paper · h-index 26

Impact in

Papers in

Michael D. Fleischauer

56 papers receiving 2.4k citations

Michael D. Fleischauer's Hit Papers

Reaction of Li with Alloy Thin Films Studied by In Situ AFM 2003 · 543 citations
5430+7+15Years since publication100200300400500

Peers

Michael D. Fleischauer
Comparison fields: 5 of 62
  • Automotive Engineering 524
  • Electrical and Electronic Engineering 2.0k
  • Electronic, Optical and Magnetic Materials 485
  • Surfaces, Coatings and Films 124
  • Polymers and Plastics 225
Replace Jun Kikkawa with:
Jun Kikkawa Japan
Leif Højslet Christensen Denmark
Julia Maibach Germany
Dongjin Byun South Korea
Shawn Sallis United States
Chong-Min Wang United States
S. D. Beattie Canada
Yuan Hou China
Binbin Xu China
Deniz Wong Germany
Michael D. Fleischauer relative to Jun Kikkawa Japan Jun Kikkawa's profile →
Citations per field
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Jun Kikkawa · 1×
Citations per year

Countries citing papers authored by Michael D. Fleischauer

Since Specialization
Citations

This map shows the geographic impact of Michael D. Fleischauer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael D. Fleischauer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael D. Fleischauer more than expected).

Fields of papers citing papers by Michael D. Fleischauer

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael D. Fleischauer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael D. Fleischauer. The network helps show where Michael D. Fleischauer may publish in the future.

Co-authors

The 25 scholars most cited alongside Michael D. Fleischauer, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Michael D. Fleischauer Line = papers co-authored together Michael D. Fleischauer links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 59 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Reaction of Li with Alloy Thin Films Studied by In Situ AFM
Hit paper breakdown →
2003543
2 2005167
3 2002157
4 2010138
5 2005136
6 200388
7 201083
8 200377
9 201175
10 200461
11 200359
12 200857
13 200849
14 200945
15 200444
16 200643
17 200639
18 202039
19 201236
20 202136

About Michael D. Fleischauer

Michael D. Fleischauer is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films and Mechanical Engineering, having authored 59 papers that have together received 2.4k indexed citations. Recurring topics across this work include Advancements in Battery Materials (16 papers), Semiconductor materials and interfaces (12 papers), Optical Coatings and Gratings (12 papers), Semiconductor materials and devices (11 papers), Advanced Battery Materials and Technologies (9 papers), Advanced Battery Technologies Research (7 papers), ZnO doping and properties (7 papers) and Thin-Film Transistor Technologies (7 papers). The work is most often cited by research in Automotive Engineering (524 citations), Electrical and Electronic Engineering (2.0k citations), Electronic, Optical and Magnetic Materials (485 citations), Surfaces, Coatings and Films (124 citations) and Polymers and Plastics (225 citations). Michael D. Fleischauer has collaborated with scholars based in Canada, United States and Germany. Frequent co-authors include J. R. Dahn, T. D. Hatchard, Arman Bonakdarpour, Luc Beaulieu, Michael J. Brett, Jessica M. Topple, M. N. Obrovac, A. D. W. Todd, P. Ferguson and S. Trussler. Their work appears in journals such as Journal of The Electrochemical Society, Thin Solid Films, Electrochemical and Solid-State Letters, ACS Applied Materials & Interfaces and Advanced Functional Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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