Michael A. Huff

1.9k citations
44 papers · 1.4k · h-index 17

Impact in

Papers in

    • Advanced MEMS and NEMS Technologies 29
    • Plasma Diagnostics and Applications 8
    • Silicon Carbide Semiconductor Technologies 3
    • Semiconductor materials and devices 2
    • Low-power high-performance VLSI design 2
    • Integrated Circuits and Semiconductor Failure Analysis 1
    • Shape Memory Alloy Transformations 9

Michael A. Huff

35 papers receiving 1.3k citations

Peers

Michael A. Huff
Comparison fields: 5 of 65
  • Electrical and Electronic Engineering 659
  • Materials Chemistry 418
  • Biomedical Engineering 269
  • Mechanical Engineering 126
  • Mechanics of Materials 73
Replace Miltiadis K. Hatalis with:
Miltiadis K. Hatalis United States
J.M. Miao Singapore
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Sarah S. Bedair United States
Bongkyun Jang South Korea
Éric Cattan France
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Zhen‐Yi Ju China
Lifeng Qin China
Reza Rastak United States
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Citations per field
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Citations per year

Countries citing papers authored by Michael A. Huff

Since Specialization
Citations

This map shows the geographic impact of Michael A. Huff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael A. Huff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael A. Huff more than expected).

Fields of papers citing papers by Michael A. Huff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael A. Huff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael A. Huff. The network helps show where Michael A. Huff may publish in the future.

Co-authors

The 18 scholars most cited alongside Michael A. Huff, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Michael A. Huff Line = papers co-authored together Michael A. Huff links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 44 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1998318
2 1998238
3 2021192
4 202282
5 200371
6 199053
7 199352
8 200147
9 199834
10 200233
11 199931
12 201730
13 200225
14 199823
15 201722
16 200221
17 200219
18 199615
19 200313
20 202012

About Michael A. Huff

Michael A. Huff is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Statistics, Probability and Uncertainty, Mechanics of Materials and Civil and Structural Engineering, having authored 44 papers that have together received 1.4k indexed citations. Recurring topics across this work include Advanced MEMS and NEMS Technologies (29 papers), Shape Memory Alloy Transformations (9 papers), Plasma Diagnostics and Applications (8 papers), Silicon Carbide Semiconductor Technologies (3 papers), Semiconductor materials and devices (2 papers), Low-power high-performance VLSI design (2 papers), Probabilistic and Robust Engineering Design (1 paper) and Integrated Circuits and Semiconductor Failure Analysis (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (659 citations), Materials Chemistry (418 citations), Biomedical Engineering (269 citations), Mechanical Engineering (126 citations) and Mechanics of Materials (73 citations). Michael A. Huff has collaborated with scholars based in United States and Germany. Frequent co-authors include H. Kahn, Arthur H. Heuer, William L. Benard, Martin A. Schmidt, Dominique M. Durand, Levent Yobaş, Boonsong Sutapun, Massood Tabib‐Azar, Mehran Mehregany and Susanne Stemmer. Their work appears in journals such as Journal of Microelectromechanical Systems, ECS Journal of Solid State Science and Technology, Applied Optics, Sensors and Actuators A Physical and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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