Mark L. O’Neill

1.1k citations

28 papers · 908 · h-index 13

Impact in

Process Chemistry and Technology top 2%
- Carbon dioxide utilization in catalysis
Polymers and Plastics top 5%
- Polymer Foaming and Composites
- Polymer crystallization and properties

Papers in

Electrical and Electronic Engineering 13
- Semiconductor materials and devices 13
Materials Chemistry 12
- Silicon Nanostructures and Photoluminescence 3

Co-authors: Keith P. Johnston (4 shared papers)Y. P. Handa (3 shared papers)Matthew Z. Yates (3 shared papers)Judith L. Kerschner (1 shared paper)Qing Cao (1 shared paper)Mingliang Fang (1 shared paper)Peeter Kruus (2 shared papers)Bing Han (4 shared papers)
Journals: Macromolecules (3 papers)The Journal of Physical Chemistry C (2 papers)Journal of Polymer Science Part B Polymer Physics (2 papers)ECS Journal of Solid State Science and Technology (2 papers)ACS Applied Materials & Interfaces (2 papers)
Partner nations: United States Canada Taiwan

In The Last Decade

Mark L. O’Neill

27 papers receiving 879 citations

Peers

Countries citing papers authored by Mark L. O’Neill

Since Specialization

Citations

This map shows the geographic impact of Mark L. O’Neill's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark L. O’Neill with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark L. O’Neill more than expected).

Fields of papers citing papers by Mark L. O’Neill

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark L. O’Neill. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark L. O’Neill. The network helps show where Mark L. O’Neill may publish in the future.

Co-authors

The 25 scholars most cited alongside Mark L. O’Neill, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mark L. O’Neill Line = papers co-authored together Mark L. O’Neill links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

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#	Work
1	Solubility of Homopolymers and Copolymers in Carbon Dioxide Industrial & Engineering Chemistry Research ·Mark L. O’Neill, Qing Cao, Mingliang Fang, Keith P. Johnston, S. P. Wilkinson, C. D. Smith, Judith L. Kerschner, Sharon H. Jureller	1998	297
2	Dispersion Polymerization in Supercritical CO₂with a Siloxane-Based Macromonomer: 1. The Particle Growth Regime Macromolecules ·Mark L. O’Neill, Matthew Z. Yates, Keith P. Johnston, C. D. Smith, S. P. Wilkinson	1998	92
3	Dispersion Polymerization in Supercritical CO₂ with Siloxane-Based Macromonomer. 2. The Particle Formation Regime Macromolecules ·Mark L. O’Neill, Matthew Z. Yates, Keith P. Johnston, C. D. Smith, S. P. Wilkinson	1998	64
4	High-pressure calorimetric study of plasticization of poly(methyl methacrylate) by methane, ethylene, and carbon dioxide Journal of Polymer Science Part B Polymer Physics ·Y. P. Handa, Peeter Kruus, Mark L. O’Neill	1996	60
5	Emulsion Stabilization and Flocculation in CO₂. 1. Turbidimetry and Tensiometry Macromolecules ·Mark L. O’Neill, Matthew Z. Yates, Kristi L. Harrison, Keith P. Johnston, Dorian A. Canelas, D. E. Betts, Joseph M. DeSimone, S. P. Wilkinson	1997	58
6	On the Mechanisms of SiO₂ Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO₂(001) Surface The Journal of Physical Chemistry C ·Bo Han, Qingfan Zhang, Jinping Wu, Bing Han, Eugene J. Karwacki, Agnes Derecskei, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Hansong Cheng	2011	48
7	Compressed-gas-induced plasticization of polymers Thermochimica Acta ·Y. P. Handa, Sherissa Capowski, Mark L. O’Neill	1993	45
8	Impact of Aminosilane Precursor Structure on Silicon Oxides by Atomic Layer Deposition The Electrochemical Society Interface ·Mark L. O’Neill, H. R. Bowen, Agnes Derecskei‐Kovacs, Kirk Cuthill, Bing Han, Ma Xiao	2011	39
9	On the plasticization of poly(2,6‐dimethyl phenylene oxide) by CO₂ Journal of Polymer Science Part B Polymer Physics ·Y. P. Handa, Steeve Lampron, Mark L. O’Neill	1994	37
10	Density functional theory study on the full ALD process of silicon nitride thin film deposition via BDEAS or BTBAS and NH₃ Physical Chemistry Chemical Physics ·Liang Huang, Bo Han, Bing Han, Agnes Derecskei‐Kovacs, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Ronald M. Pearlstein, Haripin Chandra, Hansong Cheng	2014	31
11	Designing high performance precursors for atomic layer deposition of silicon oxide Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Anupama Mallikarjunan, Haripin Chandra, Manchao Xiao, Xinjian Lei, Ronald M. Pearlstein, Heather R. Bowen, Mark L. O’Neill, Agnes Derecskei‐Kovacs, Bing Han	2014	24
12	First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO₂Thin Films with Di(sec-butylamino)silane and Ozone The Journal of Physical Chemistry C ·Liang Huang, Bo Han, Bing Han, Agnes Derecskei‐Kovacs, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Ronald M. Pearlstein, Haripin Chandra, Hansong Cheng, Haripin Chandra	2013	20
13	Solvatochromic parameters and solubilities in supercritical fluid systems Canadian Journal of Chemistry ·Mark L. O’Neill, Peeter Kruus, Robert Burk	1993	17
14	Structural characterization of a porous low-dielectric-constant thin film with a non-uniform depth profile Applied Physics Letters ·Eric K. Lin, Hae‐Jeong Lee, Gary W. Lynn, Wen‐Li Wu, Mark L. O’Neill	2002	11
15	Effect of deposition temperature and oxygen flow rate on properties of low dielectric constant SiCOH film prepared by plasma enhanced chemical vapor deposition using diethoxymethylsilane Surface and Coatings Technology ·Yulin Cheng, Y.L. Wang, G.J. Hwang, Mark L. O’Neill, Eugene J. Karwacki, Po‐Tsun Liu, Chilai Chen	2005	11
16	Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4. MRS Proceedings ·Raymond N. Vrtis, Mark L. O’Neill, Jean‐Louis Vincent, A.S. Lukas, Brian K. Peterson, Mark D. Bitner, Eugene J. Karwacki	2003	10
17	Impact of Pore Size and Morphology of Porous Organosilicate Glasses on Integrated Circuit Manufacturing MRS Proceedings ·Mark L. O’Neill, Mary K. Haas, Brian K. Peterson, Raymond N. Vrtis, Scott J. Weigel, Dingjun Wu, Mark D. Bitner, Eugene J. Karwacki	2006	9
18	Tribological, Thermal and Kinetic Characterization of SiO ₂ and Si ₃ N ₄ Polishing for STI CMP on Blanket and Patterned Wafers ECS Journal of Solid State Science and Technology ·Juan Cristobal Mariscal, Jeffrey McAllister, Yasa Sampurno, Jon Sierra Suarez, Mark L. O’Neill, Hongjun Zhou, Malcolm Grief, Dave Slutz, Ara Philipossian	2020	8
19	Stirred Not Shaken: Facile Production of High-Quality, High-Concentration Graphene Aqueous Suspensions Assisted by a Protein ACS Applied Materials & Interfaces ·Megan K. Puglia, Sohan Aziz, Kevin M. Brady, Mark L. O’Neill, Challa V. Kumar	2019	7
20	Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition MRS Proceedings ·Mark L. O’Neill, Raymond N. Vrtis, Jean‐Louis Vincent, A.S. Lukas, Eugene J. Karwacki, Brian K. Peterson, Mark D. Bitner	2003	6

About Mark L. O’Neill

Mark L. O’Neill is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Biomedical Engineering and Polymers and Plastics, having authored 28 papers that have together received 908 indexed citations. Recurring topics across this work include Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (9 papers), Polymer Foaming and Composites (7 papers), Phase Equilibria and Thermodynamics (5 papers), Metal and Thin Film Mechanics (4 papers), Advanced ceramic materials synthesis (4 papers), Polymer crystallization and properties (3 papers) and Silicon Nanostructures and Photoluminescence (3 papers). The work is most often cited by research in Process Chemistry and Technology (192 citations), Polymers and Plastics (347 citations), Catalysis (119 citations), Biomedical Engineering (427 citations) and Materials Chemistry (287 citations). Mark L. O’Neill has collaborated with scholars based in United States, Canada and Taiwan. Frequent co-authors include Keith P. Johnston, Y. P. Handa, Matthew Z. Yates, Judith L. Kerschner, Qing Cao, Mingliang Fang, Peeter Kruus, Bing Han, Agnes Derecskei‐Kovacs and Xinjian Lei. Their work appears in journals such as Macromolecules, The Journal of Physical Chemistry C, Journal of Polymer Science Part B Polymer Physics, ECS Journal of Solid State Science and Technology and ACS Applied Materials & Interfaces.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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