Mark A. Sobolewski

1.6k citations
50 papers · 1.1k · h-index 19

Impact in

Papers in

    • Plasma Diagnostics and Applications 40
    • Semiconductor materials and devices 17
    • Electrohydrodynamics and Fluid Dynamics 10
    • Magnetic Field Sensors Techniques 4
    • Integrated Circuits and Semiconductor Failure Analysis 4
    • Metal and Thin Film Mechanics 15
    • Laser-induced spectroscopy and plasma 8

Mark A. Sobolewski

50 papers receiving 1.0k citations

Peers

Mark A. Sobolewski
Comparison fields: 5 of 44
  • Mechanics of Materials 461
  • Electrical and Electronic Engineering 976
  • Surfaces, Coatings and Films 44
  • Atomic and Molecular Physics, and Optics 194
  • Radiology, Nuclear Medicine and Imaging 111
Replace Jeroen Jonkers with:
Jeroen Jonkers Netherlands
Margarita Baeva Germany
C. Boisse-Laporte France
I. S. Falconer Australia
Costel Biloiu United States
Sang Ki Nam United States
M. Šı́cha Czechia
James S. Sovey United States
S. K. Karkari India
S. J. You South Korea
Mark A. Sobolewski relative to Jeroen Jonkers Netherlands Jeroen Jonkers's profile →
Citations per field
00.5×1.7×
Jeroen Jonkers · 1×
Citations per year

Countries citing papers authored by Mark A. Sobolewski

Since Specialization
Citations

This map shows the geographic impact of Mark A. Sobolewski's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark A. Sobolewski with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark A. Sobolewski more than expected).

Fields of papers citing papers by Mark A. Sobolewski

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark A. Sobolewski. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark A. Sobolewski. The network helps show where Mark A. Sobolewski may publish in the future.

Co-authors

The 25 scholars most cited alongside Mark A. Sobolewski, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mark A. Sobolewski Line = papers co-authored together Mark A. Sobolewski links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 50 papers — load more, or switch the sort, to bring in the rest.

#Work
1 199994
2 199288
3 199576
4 200061
5 200759
6 200257
7 198848
8 199847
9 199945
10 200140
11 199840
12 199531
13 199726
14 199325
15 200624
16 199923
17 199923
18 198822
19 198922
20 200417

About Mark A. Sobolewski

Mark A. Sobolewski is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Atomic and Molecular Physics, and Optics, Materials Chemistry and Radiology, Nuclear Medicine and Imaging, having authored 50 papers that have together received 1.1k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (40 papers), Semiconductor materials and devices (17 papers), Metal and Thin Film Mechanics (15 papers), Electrohydrodynamics and Fluid Dynamics (10 papers), Laser-induced spectroscopy and plasma (8 papers), Plasma Applications and Diagnostics (5 papers), Magnetic Field Sensors Techniques (4 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). The work is most often cited by research in Mechanics of Materials (461 citations), Electrical and Electronic Engineering (976 citations), Surfaces, Coatings and Films (44 citations), Atomic and Molecular Physics, and Optics (194 citations) and Radiology, Nuclear Medicine and Imaging (111 citations). Mark A. Sobolewski has collaborated with scholars based in United States, Serbia and South Korea. Frequent co-authors include Yicheng Wang, C. R. Helms, Kristen L. Steffens, James K. Olthoff, Jung‐Hyung Kim, A. N. Goyette, B. Felker, J.G. Langan, R. Browning and David L. Lahr. Their work appears in journals such as Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Plasma Sources Science and Technology and IEEE Transactions on Plasma Science.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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