M. Ruff

1.1k citations
27 papers · 920 · 1 hit paper · h-index 14

Impact in

    • Semiconductor materials and interfaces
    • Advanced Chemical Physics Studies
    • Semiconductor Quantum Structures and Devices
    • Silicon Carbide Semiconductor Technologies
    • Semiconductor materials and devices
    • Electromagnetic Compatibility and Noise Suppression
    • Advancements in Semiconductor Devices and Circuit Design

Papers in

M. Ruff

26 papers receiving 880 citations

M. Ruff's Hit Papers

SiC devices: physics and numerical simulation 1994 · 426 citations
4260+10+21Years since publication100200300400

Peers

M. Ruff
Comparison fields: 5 of 67
  • Atomic and Molecular Physics, and Optics 317
  • Electrical and Electronic Engineering 569
  • Process Chemistry and Technology 27
  • Catalysis 46
  • Materials Chemistry 236
Replace Noboru Taguchi with:
Noboru Taguchi Japan
Alina Bruma United States
J.C. Dupuy France
Jianxin Wu China
P. L. J. Gunter Netherlands
Jinlan Nie China
Satoshi Hiroi Japan
Kei Mitsuhara Japan
Hao Tian China
Daniel J. Kelly United Kingdom
M. Ruff relative to Noboru Taguchi Japan Noboru Taguchi's profile →
Citations per field
00.5×1.5×
Noboru Taguchi · 1×
Citations per year

Countries citing papers authored by M. Ruff

Since Specialization
Citations

This map shows the geographic impact of M. Ruff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Ruff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Ruff more than expected).

Fields of papers citing papers by M. Ruff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Ruff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Ruff. The network helps show where M. Ruff may publish in the future.

Co-authors

The 25 scholars most cited alongside M. Ruff, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with M. Ruff Line = papers co-authored together M. Ruff links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 27 papers — load more, or switch the sort, to bring in the rest.

#Work
1
SiC devices: physics and numerical simulation
Hit paper breakdown →
1994426
2 200762
3 199759
4 199849
5 201242
6 199639
7 201328
8 199028
9 201227
10 199324
11 199923
12 199619
13 201013
14 199713
15 201312
16 199610
17 19948
18 20027
19 19786
20 19976

About M. Ruff

M. Ruff is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Materials Chemistry, Organic Chemistry and Polymers and Plastics, having authored 27 papers that have together received 920 indexed citations. Recurring topics across this work include Advanced Chemical Physics Studies (6 papers), Silicon Carbide Semiconductor Technologies (5 papers), Semiconductor Quantum Structures and Devices (5 papers), Polymer crystallization and properties (3 papers), Semiconductor Lasers and Optical Devices (3 papers), Catalytic Processes in Materials Science (3 papers), Thin-Film Transistor Technologies (3 papers) and Advanced Semiconductor Detectors and Materials (2 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (317 citations), Electrical and Electronic Engineering (569 citations), Process Chemistry and Technology (27 citations), Catalysis (46 citations) and Materials Chemistry (236 citations). M. Ruff has collaborated with scholars based in Germany, Austria and United States. Frequent co-authors include R. Helbig, H. Mitlehner, R. Jürgen Behm, Christian Paulik, Ping Liu, Jens K. Nørskov, S. Frey, U. Rößler, Reinhold W. Lang and H.‐J. Schulze. Their work appears in journals such as IEEE Transactions on Electron Devices, Macromolecular Reaction Engineering, Applied Physics Letters, Surface Science and Journal of Crystal Growth.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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