M. Doerner
Impact in
- Mechanics of Materials top 0.2%
- Metal and Thin Film Mechanics
- Adhesion, Friction, and Surface Interactions
-
- Magnetic properties of thin films
- Force Microscopy Techniques and Applications
Papers in
-
- Magnetic properties of thin films 33
-
- Magnetic Properties and Applications 13
- Copper Interconnects and Reliability 6
- Co-authors
- William D. Nix (4 shared papers)D. Weller (9 shared papers)A. Moser (8 shared papers)M.E. Best (6 shared papers)Michael F. Toney (8 shared papers)Wen Lee (1 shared paper)M. M. Schwickert (1 shared paper)L. Folks (1 shared paper)
- Journals
- IEEE Transactions on Magnetics (21 papers)Journal of Applied Physics (13 papers)Applied Physics Letters (2 papers)Journal of materials research/Pratt's guide to venture capital sources (2 papers)Scripta Materialia (1 paper)
- Partner nations
- United StatesUnited KingdomJapan
In The Last Decade
M. Doerner
49 papers receiving 5.6k citations
M. Doerner's Hit Papers
Peers
Comparison fields: 5 of 103
- Mechanics of Materials 3.0k
- Atomic and Molecular Physics, and Optics 2.8k
- Electronic, Optical and Magnetic Materials 1.7k
- Materials Chemistry 2.5k
- Condensed Matter Physics 566
Countries citing papers authored by M. Doerner
This map shows the geographic impact of M. Doerner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Doerner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Doerner more than expected).
Fields of papers citing papers by M. Doerner
This network shows the impact of papers produced by M. Doerner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Doerner. The network helps show where M. Doerner may publish in the future.
Co-authors
The 25 scholars most cited alongside M. Doerner, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 53 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | A method for interpreting the data from depth-sensing indentation instruments Hit paper breakdown → | 1986 | 2425 |
| 2 | High K/sub u/ materials approach to 100 Gbits/in/sup 2/ Hit paper breakdown → | 2000 | 1203 |
| 3 | Stresses and deformation processes in thin films on substrates Hit paper breakdown → | 1988 | 530 |
| 4 | 1986 | 307 | |
| 5 | 2000 | 228 | |
| 6 | 2000 | 222 | |
| 7 | 1988 | 116 | |
| 8 | 1999 | 69 | |
| 9 | 1999 | 67 | |
| 10 | 1989 | 63 | |
| 11 | 1995 | 63 | |
| 12 | 1989 | 53 | |
| 13 | 1997 | 48 | |
| 14 | 2000 | 42 | |
| 15 | 1999 | 39 | |
| 16 | 1995 | 39 | |
| 17 | 1987 | 38 | |
| 18 | 1993 | 38 | |
| 19 | 1996 | 35 | |
| 20 | 2001 | 31 |
About M. Doerner
M. Doerner is a scholar working on Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Condensed Matter Physics and Electrical and Electronic Engineering, having authored 53 papers that have together received 5.9k indexed citations. Recurring topics across this work include Magnetic properties of thin films (33 papers), Metal and Thin Film Mechanics (13 papers), Magnetic Properties and Applications (13 papers), Theoretical and Computational Physics (10 papers), Metallic Glasses and Amorphous Alloys (6 papers), Adhesion, Friction, and Surface Interactions (6 papers), Copper Interconnects and Reliability (6 papers) and Semiconductor materials and devices (5 papers). The work is most often cited by research in Mechanics of Materials (3.0k citations), Atomic and Molecular Physics, and Optics (2.8k citations), Electronic, Optical and Magnetic Materials (1.7k citations), Materials Chemistry (2.5k citations) and Condensed Matter Physics (566 citations). M. Doerner has collaborated with scholars based in United States, United Kingdom and Japan. Frequent co-authors include William D. Nix, D. Weller, A. Moser, M.E. Best, Michael F. Toney, Wen Lee, M. M. Schwickert, L. Folks, Jan-Ulrich Thiele and Donald S. Gardner. Their work appears in journals such as IEEE Transactions on Magnetics, Journal of Applied Physics, Applied Physics Letters, Journal of materials research/Pratt's guide to venture capital sources and Scripta Materialia.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.