Keping Yan
Impact in
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- Plasma Applications and Diagnostics
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- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Aerosol Filtration and Electrostatic Precipitation
- Gas Sensing Nanomaterials and Sensors
Papers in
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- Aerosol Filtration and Electrostatic Precipitation 39
- Plasma Diagnostics and Applications 37
- Electrohydrodynamics and Fluid Dynamics 31
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- Plasma Applications and Diagnostics 90
- Co-authors
- E.J.M. van Heesch (52 shared papers)A.J.M. Pemen (48 shared papers)Yifan Huang (28 shared papers)S.A. Nair (27 shared papers)G.J.J. Winands (22 shared papers)K.J. Ptasiński (13 shared papers)Zhen Liu (18 shared papers)A.A.H. Drinkenburg (11 shared papers)
- Journals
- Journal of Electrostatics (15 papers)IEEE Transactions on Plasma Science (13 papers)Chemical Engineering Journal (8 papers)Review of Scientific Instruments (7 papers)Plasma Chemistry and Plasma Processing (6 papers)
- Partner nations
- ChinaNetherlandsUnited States
In The Last Decade
Keping Yan
171 papers receiving 2.9k citations
Peers
Comparison fields: 5 of 109
- Radiology, Nuclear Medicine and Imaging 1.5k
- Electrical and Electronic Engineering 1.7k
- Materials Chemistry 1.2k
- Catalysis 156
- Surfaces, Coatings and Films 115
Countries citing papers authored by Keping Yan
This map shows the geographic impact of Keping Yan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Keping Yan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Keping Yan more than expected).
Fields of papers citing papers by Keping Yan
This network shows the impact of papers produced by Keping Yan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Keping Yan. The network helps show where Keping Yan may publish in the future.
Co-authors
The 25 scholars most cited alongside Keping Yan, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 175 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2001 | 109 | |
| 2 | 2016 | 107 | |
| 3 | 2013 | 85 | |
| 4 | 1998 | 84 | |
| 5 | 2003 | 80 | |
| 6 | 2015 | 70 | |
| 7 | 2008 | 69 | |
| 8 | 1999 | 68 | |
| 9 | 2005 | 68 | |
| 10 | 2006 | 60 | |
| 11 | 2001 | 59 | |
| 12 | 2006 | 52 | |
| 13 | 2010 | 48 | |
| 14 | 2023 | 47 | |
| 15 | 2014 | 47 | |
| 16 | 2003 | 46 | |
| 17 | 2016 | 46 | |
| 18 | 2004 | 45 | |
| 19 | 2003 | 42 | |
| 20 | 2013 | 41 |
About Keping Yan
Keping Yan is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging, Materials Chemistry, Control and Systems Engineering and Aerospace Engineering, having authored 175 papers that have together received 3.0k indexed citations. Recurring topics across this work include Plasma Applications and Diagnostics (90 papers), Aerosol Filtration and Electrostatic Precipitation (39 papers), Plasma Diagnostics and Applications (37 papers), Electrohydrodynamics and Fluid Dynamics (31 papers), Pulsed Power Technology Applications (23 papers), Catalytic Processes in Materials Science (21 papers), High voltage insulation and dielectric phenomena (16 papers) and Gyrotron and Vacuum Electronics Research (14 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (1.5k citations), Electrical and Electronic Engineering (1.7k citations), Materials Chemistry (1.2k citations), Catalysis (156 citations) and Surfaces, Coatings and Films (115 citations). Keping Yan has collaborated with scholars based in China, Netherlands and United States. Frequent co-authors include E.J.M. van Heesch, A.J.M. Pemen, Yifan Huang, S.A. Nair, G.J.J. Winands, K.J. Ptasiński, Zhen Liu, A.A.H. Drinkenburg, Fada Feng and Xuming Zhang. Their work appears in journals such as Journal of Electrostatics, IEEE Transactions on Plasma Science, Chemical Engineering Journal, Review of Scientific Instruments and Plasma Chemistry and Plasma Processing.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.