J. Asmussen
Impact in
- Mechanics of Materials top 1%
- Metal and Thin Film Mechanics
- Materials Chemistry top 5%
- Diamond and Carbon-based Materials Research
Papers in
-
- Plasma Diagnostics and Applications 73
- Semiconductor materials and devices 16
-
- Particle accelerators and beam dynamics 40
- Co-authors
- T.A. Grotjohn (38 shared papers)D.K. Reinhard (25 shared papers)Thomas Schuelke (13 shared papers)Jeffrey Hopwood (6 shared papers)James R. Russell (1 shared paper)M. C. Hawley (10 shared papers)Michael Becker (10 shared papers)Stanley J. Whitehair (6 shared papers)
- Journals
- Diamond and Related Materials (28 papers)Review of Scientific Instruments (15 papers)Applied Physics Letters (10 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (10 papers)IEEE Transactions on Plasma Science (6 papers)
- Partner nations
- United StatesGermanyJapan
In The Last Decade
J. Asmussen
144 papers receiving 2.5k citations
Peers
Comparison fields: 5 of 99
- Mechanics of Materials 988
- Materials Chemistry 1.3k
- Electrical and Electronic Engineering 1.5k
- Classics 102
- Aerospace Engineering 516
Countries citing papers authored by J. Asmussen
This map shows the geographic impact of J. Asmussen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Asmussen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Asmussen more than expected).
Fields of papers citing papers by J. Asmussen
This network shows the impact of papers produced by J. Asmussen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Asmussen. The network helps show where J. Asmussen may publish in the future.
Co-authors
The 25 scholars most cited alongside J. Asmussen, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 150 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1991 | 109 | |
| 2 | 2014 | 100 | |
| 3 | 2015 | 78 | |
| 4 | 1990 | 70 | |
| 5 | 2013 | 67 | |
| 6 | 2010 | 62 | |
| 7 | 1974 | 60 | |
| 8 | 2002 | 56 | |
| 9 | 2003 | 56 | |
| 10 | 2012 | 53 | |
| 11 | 2008 | 52 | |
| 12 | 2010 | 51 | |
| 13 | 1997 | 50 | |
| 14 | 1987 | 47 | |
| 15 | 1997 | 47 | |
| 16 | 2007 | 45 | |
| 17 | 1983 | 44 | |
| 18 | 1987 | 42 | |
| 19 | 2010 | 41 | |
| 20 | 2009 | 40 |
About J. Asmussen
J. Asmussen is a scholar working on Electrical and Electronic Engineering, Aerospace Engineering, Mechanics of Materials, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 150 papers that have together received 2.7k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (73 papers), Diamond and Carbon-based Materials Research (46 papers), Particle accelerators and beam dynamics (40 papers), Metal and Thin Film Mechanics (40 papers), Gyrotron and Vacuum Electronics Research (23 papers), Semiconductor materials and devices (16 papers), Plasma Applications and Diagnostics (14 papers) and Dust and Plasma Wave Phenomena (10 papers). The work is most often cited by research in Mechanics of Materials (988 citations), Materials Chemistry (1.3k citations), Electrical and Electronic Engineering (1.5k citations), Classics (102 citations) and Aerospace Engineering (516 citations). J. Asmussen has collaborated with scholars based in United States, Germany and Japan. Frequent co-authors include T.A. Grotjohn, D.K. Reinhard, Thomas Schuelke, Jeffrey Hopwood, James R. Russell, M. C. Hawley, Michael Becker, Stanley J. Whitehair, Peng Un Mak and Wenxi Huang. Their work appears in journals such as Diamond and Related Materials, Review of Scientific Instruments, Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and IEEE Transactions on Plasma Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.