Hans Höft
Impact in
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- Plasma Applications and Diagnostics
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- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Aerosol Filtration and Electrostatic Precipitation
- Electrostatic Discharge in Electronics
Papers in
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- Plasma Diagnostics and Applications 31
- Electrohydrodynamics and Fluid Dynamics 21
- Electrostatic Discharge in Electronics 10
- Gas Sensing Nanomaterials and Sensors 1
- Laser Design and Applications 1
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- Plasma Applications and Diagnostics 34
- Co-authors
- Manfred Kettlitz (23 shared papers)Ronny Brandenburg (18 shared papers)Tomáš Hoder (8 shared papers)Markus M. Becker (12 shared papers)Klaus‐Dieter Weltmann (9 shared papers)Detlef Loffhagen (5 shared papers)T. Huiskamp (5 shared papers)Stephan Reuter (1 shared paper)
- Journals
- Journal of Physics D Applied Physics (12 papers)Plasma Sources Science and Technology (8 papers)The European Physical Journal D (4 papers)IEEE Transactions on Plasma Science (4 papers)Physics of Plasmas (3 papers)
- Partner nations
- GermanyNetherlandsFrance
In The Last Decade
Hans Höft
34 papers receiving 580 citations
Peers
Comparison fields: 5 of 43
- Radiology, Nuclear Medicine and Imaging 520
- Electrical and Electronic Engineering 556
- Acoustics and Ultrasonics 2
- Surfaces, Coatings and Films 15
- Mechanics of Materials 42
Countries citing papers authored by Hans Höft
This map shows the geographic impact of Hans Höft's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hans Höft with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hans Höft more than expected).
Fields of papers citing papers by Hans Höft
This network shows the impact of papers produced by Hans Höft. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hans Höft. The network helps show where Hans Höft may publish in the future.
Co-authors
The 25 scholars most cited alongside Hans Höft, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 37 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2014 | 64 | |
| 2 | 2012 | 58 | |
| 3 | 2013 | 48 | |
| 4 | 2013 | 45 | |
| 5 | 2012 | 45 | |
| 6 | 2016 | 35 | |
| 7 | 2016 | 34 | |
| 8 | 2013 | 31 | |
| 9 | 2018 | 25 | |
| 10 | 2018 | 22 | |
| 11 | 2016 | 18 | |
| 12 | 2018 | 16 | |
| 13 | 2014 | 16 | |
| 14 | 2021 | 15 | |
| 15 | 2023 | 14 | |
| 16 | 2020 | 14 | |
| 17 | 2020 | 10 | |
| 18 | 2014 | 9 | |
| 19 | 2021 | 9 | |
| 20 | 2023 | 8 |
About Hans Höft
Hans Höft is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging, Molecular Biology, Control and Systems Engineering and Mechanics of Materials, having authored 37 papers that have together received 608 indexed citations. Recurring topics across this work include Plasma Applications and Diagnostics (34 papers), Plasma Diagnostics and Applications (31 papers), Electrohydrodynamics and Fluid Dynamics (21 papers), Electrostatic Discharge in Electronics (10 papers), Gas Sensing Nanomaterials and Sensors (1 paper), Laser-induced spectroscopy and plasma (1 paper), Laser Design and Applications (1 paper) and Plasma and Flow Control in Aerodynamics (1 paper). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (520 citations), Electrical and Electronic Engineering (556 citations), Acoustics and Ultrasonics (2 citations), Surfaces, Coatings and Films (15 citations) and Mechanics of Materials (42 citations). Hans Höft has collaborated with scholars based in Germany, Netherlands and France. Frequent co-authors include Manfred Kettlitz, Ronny Brandenburg, Tomáš Hoder, Markus M. Becker, Klaus‐Dieter Weltmann, Detlef Loffhagen, T. Huiskamp, Stephan Reuter, K.‐D. Weltmann and Uwe Czarnetzki. Their work appears in journals such as Journal of Physics D Applied Physics, Plasma Sources Science and Technology, The European Physical Journal D, IEEE Transactions on Plasma Science and Physics of Plasmas.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.