F. Bigl
Impact in
- Computational Mechanics top 2%
- Ion-surface interactions and analysis
- Laser Material Processing Techniques
- Surfaces, Coatings and Films top 10%
Papers in
-
- Integrated Circuits and Semiconductor Failure Analysis 10
- Semiconductor materials and devices 8
- Plasma Diagnostics and Applications 6
- Chalcogenide Semiconductor Thin Films 6
-
- Ion-surface interactions and analysis 15
- Laser Material Processing Techniques 8
- Co-authors
- A. Schindler (14 shared papers)Frank Frost (10 shared papers)K. Zimmer (13 shared papers)A. Braun (9 shared papers)H. Neumann (8 shared papers)D. Hirsch (9 shared papers)Michael Zeuner (4 shared papers)Frank Scholze (4 shared papers)
- Journals
- Applied Surface Science (8 papers)Applied Physics A (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Surface and Coatings Technology (3 papers)Journal of Applied Physics (3 papers)
- Partner nations
- GermanyUnited KingdomRussia
In The Last Decade
F. Bigl
43 papers receiving 944 citations
Peers
Comparison fields: 5 of 52
- Computational Mechanics 632
- Surfaces, Coatings and Films 79
- Electrical and Electronic Engineering 599
- Mechanics of Materials 209
- Materials Chemistry 386
Countries citing papers authored by F. Bigl
This map shows the geographic impact of F. Bigl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F. Bigl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F. Bigl more than expected).
Fields of papers citing papers by F. Bigl
This network shows the impact of papers produced by F. Bigl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F. Bigl. The network helps show where F. Bigl may publish in the future.
Co-authors
The 25 scholars most cited alongside F. Bigl, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 44 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2000 | 294 | |
| 2 | 1996 | 74 | |
| 3 | 1996 | 60 | |
| 4 | 2002 | 58 | |
| 5 | 1998 | 47 | |
| 6 | 2001 | 38 | |
| 7 | 1998 | 35 | |
| 8 | 1998 | 31 | |
| 9 | 1999 | 30 | |
| 10 | 2001 | 29 | |
| 11 | 1999 | 26 | |
| 12 | 1997 | 26 | |
| 13 | 1998 | 23 | |
| 14 | 2000 | 23 | |
| 15 | 2001 | 22 | |
| 16 | 1999 | 19 | |
| 17 | 2000 | 19 | |
| 18 | 2000 | 17 | |
| 19 | 1997 | 16 | |
| 20 | 2000 | 13 |
About F. Bigl
F. Bigl is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Materials Chemistry, Biomedical Engineering and Mechanics of Materials, having authored 44 papers that have together received 990 indexed citations. Recurring topics across this work include Ion-surface interactions and analysis (15 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Laser Material Processing Techniques (8 papers), Semiconductor materials and devices (8 papers), Metal and Thin Film Mechanics (7 papers), Plasma Diagnostics and Applications (6 papers), Advanced Surface Polishing Techniques (6 papers) and Chalcogenide Semiconductor Thin Films (6 papers). The work is most often cited by research in Computational Mechanics (632 citations), Surfaces, Coatings and Films (79 citations), Electrical and Electronic Engineering (599 citations), Mechanics of Materials (209 citations) and Materials Chemistry (386 citations). F. Bigl has collaborated with scholars based in Germany, United Kingdom and Russia. Frequent co-authors include A. Schindler, Frank Frost, K. Zimmer, A. Braun, H. Neumann, D. Hirsch, Michael Zeuner, Frank Scholze, G. Lippold and B. Rauschenbach. Their work appears in journals such as Applied Surface Science, Applied Physics A, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Surface and Coatings Technology and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.