D.C. Schram

2.0k citations

67 papers · 1.8k · h-index 27

Impact in

Mechanics of Materials top 2%
- Laser-induced spectroscopy and plasma
- Metal and Thin Film Mechanics
Electrical and Electronic Engineering top 5%
- Plasma Diagnostics and Applications
- Thin-Film Transistor Technologies

Papers in

Electrical and Electronic Engineering 49
- Plasma Diagnostics and Applications 33
- Thin-Film Transistor Technologies 9
Atomic and Molecular Physics, and Optics 32
- Atomic and Molecular Physics 18

Co-authors: M. C. M. van de Sanden (33 shared papers)W. M. M. Kessels (9 shared papers)J.A.M. van der Mullen (9 shared papers)Rfg Ralph Meulenbroeks (6 shared papers)D. K. Otorbaev (6 shared papers)B. van der Sijde (7 shared papers)R. J. Severens (5 shared papers)R. Engeln (9 shared papers)
Journals: Plasma Sources Science and Technology (10 papers)Journal of Applied Physics (7 papers)Journal of Quantitative Spectroscopy and Radiative Transfer (3 papers)Spectrochimica Acta Part B Atomic Spectroscopy (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)
Partner nations: Netherlands Germany United States

In The Last Decade

D.C. Schram

67 papers receiving 1.7k citations

Peers

Countries citing papers authored by D.C. Schram

Since Specialization

Citations

This map shows the geographic impact of D.C. Schram's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D.C. Schram with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D.C. Schram more than expected).

Fields of papers citing papers by D.C. Schram

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D.C. Schram. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D.C. Schram. The network helps show where D.C. Schram may publish in the future.

Co-authors

The 25 scholars most cited alongside D.C. Schram, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D.C. Schram Line = papers co-authored together D.C. Schram links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 67 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	A combined Thomson–Rayleigh scattering diagnostic using an intensified photodiode array Review of Scientific Instruments ·M. C. M. van de Sanden, Guido Janssen, J. M. de Regt, D.C. Schram, J.A.M. van der Mullen, B. van der Sijde	1992	105
2	Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma Journal of Applied Physics ·M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, Rfg Ralph Meulenbroeks, D.C. Schram	1998	104
3	Argon-hydrogen plasma jet investigated by active and passive spectroscopic means Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·Rfg Ralph Meulenbroeks, (unknown), A. J. G. van Helvoort, M. C. M. van de Sanden, D.C. Schram	1994	92
4	Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar–H2–SiH4 plasma Journal of Applied Physics ·W. M. M. Kessels, R. J. Severens, Arno H. M. Smets, B.A. Korevaar, G.J. Adriaenssens, D.C. Schram, M. C. M. van de Sanden	2001	84
5	Recombination of argon in an expanding plasma jet Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·M. C. M. van de Sanden, J. M. de Regt, D.C. Schram	1993	83
6	Physics of non-equilibrium plasmas Data Archiving and Networked Services (DANS) ·V. M. Lelevkin, D. K. Otorbaev, D.C. Schram	1992	79
7	A two-dimensional nonequilibrium model of cascaded arc plasma flows Physics of Fluids B Plasma Physics ·JJ Beulens, Dragomir Milojevic, D.C. Schram, P. M. Vallinga	1991	74
8	On the charge transfer in an inductively coupled argon plasma Spectrochimica Acta Part B Atomic Spectroscopy ·J.A.M. van der Mullen, Ivo J. Raaijmakers, A.C.A.P. van Lammeren, D.C. Schram, B. van der Sijde, Hjw Schenkelaars	1987	51
9	Production Mechanisms of NH and NH₂ Radicals in N₂−H₂ Plasmas The Journal of Physical Chemistry A ·J. H. van Helden, P.J. van den Oever, W. M. M. Kessels, M. C. M. van de Sanden, D.C. Schram, R. Engeln	2007	46
10	Cavity ring down detection of SiH3 in a remote SiH4 plasma and comparison with model calculations and mass spectrometry Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·W. M. M. Kessels, A. Leroux, M. G. H. Boogaarts, J.P.M. Hoefnagels, M. C. M. van de Sanden, D.C. Schram	2001	42
11	The isentropic exponent in plasmas Physics of Plasmas ·K. T. A. L. Burm, W. J. Goedheer, D.C. Schram	1999	41
12	Rotation of a strongly magnetized hydrogen plasma column determined from an asymmetric Balmer-βspectral line with two radiating distributions Physical Review E ·A.E. Shumack, V. P. Veremiyenko, D.C. Schram, H.J. de Blank, W. J. Goedheer, H.J. van der Meiden, W.A.J. Vijvers, J. Westerhout, N.J. Lopes Cardozo, G.J. van Rooij	2008	41
13	Hydrogen poor cationic silicon clusters in an expanding argon–hydrogen–silane plasma Applied Physics Letters ·W. M. M. Kessels, M. C. M. van de Sanden, D.C. Schram	1998	38
14	Characteristic quantities of a cascade arc used as a light source for spectroscopic techniques Measurement Science and Technology ·A.T.M. Wilbers, G. M. W. Kroesen, C.J. Timmermans, D.C. Schram	1990	38
15	Four ways to determine the electron density in low-temperature plasmas Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·Rfg Ralph Meulenbroeks, M.F.M. Steenbakkers, Z Zhou Qing, M. C. M. van de Sanden, D.C. Schram	1994	36
16	Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·W. M. M. Kessels, F.J.H. van Assche, Joonhwa Hong, D.C. Schram, M. C. M. van de Sanden	2003	36
17	Electron density and temperature determination in an ICP using a non-equilibrium concept Spectrochimica Acta Part B Atomic Spectroscopy ·Sascha Nowak, J.A.M. van der Mullen, D.C. Schram	1988	36
18	Collective scattering of CO2-laser light from ion-acoustic turbulence The Physics of Fluids ·B. F. M. Pots, J Coumans, D.C. Schram	1981	35
19	Fast deposition of amorphous carbon films by an expanding cascaded arc plasma jet Journal of Applied Physics ·Ajm Buuron, M. C. M. van de Sanden, W.J. van Ooij, R. M. A. Driessens, D.C. Schram	1995	34
20	Trace gas measurements using optically resonant cavities and quantum cascade lasers operating at room temperature Journal of Applied Physics ·S. Welzel, G. Lombardi, P. B. Davies, R. Engeln, D.C. Schram, J. Röpcke	2008	33

About D.C. Schram

D.C. Schram is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Mechanics of Materials, Materials Chemistry and Spectroscopy, having authored 67 papers that have together received 1.8k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (33 papers), Laser-induced spectroscopy and plasma (25 papers), Atomic and Molecular Physics (18 papers), Magnetic confinement fusion research (13 papers), Thin-Film Transistor Technologies (9 papers), Spectroscopy and Laser Applications (8 papers), Metal and Thin Film Mechanics (7 papers) and Diamond and Carbon-based Materials Research (7 papers). The work is most often cited by research in Mechanics of Materials (698 citations), Electrical and Electronic Engineering (1.2k citations), Atomic and Molecular Physics, and Optics (561 citations), Radiology, Nuclear Medicine and Imaging (318 citations) and Materials Chemistry (712 citations). D.C. Schram has collaborated with scholars based in Netherlands, Germany and United States. Frequent co-authors include M. C. M. van de Sanden, W. M. M. Kessels, J.A.M. van der Mullen, Rfg Ralph Meulenbroeks, D. K. Otorbaev, B. van der Sijde, R. J. Severens, R. Engeln, W. J. Goedheer and JJ Beulens. Their work appears in journals such as Plasma Sources Science and Technology, Journal of Applied Physics, Journal of Quantitative Spectroscopy and Radiative Transfer, Spectrochimica Acta Part B Atomic Spectroscopy and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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D.C. Schram

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