David A. Glocker
Impact in
- Mechanics of Materials top 10%
- Metal and Thin Film Mechanics
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- GaN-based semiconductor devices and materials
Papers in
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- Metal and Thin Film Mechanics 13
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- GaN-based semiconductor devices and materials 5
- Co-authors
- Mark A. Lewis (1 shared paper)Jacob Jorné (1 shared paper)M. J. Skove (2 shared papers)R.L. Wiseman (1 shared paper)J. W. Cook (1 shared paper)Surendra K. Gupta (1 shared paper)George W. Scherer (1 shared paper)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (5 papers)Surface and Coatings Technology (2 papers)Journal of Applied Physics (2 papers)Applied Physics Letters (1 paper)The Journal of Chemical Physics (1 paper)
- Partner nations
- United States
In The Last Decade
David A. Glocker
22 papers receiving 269 citations
Peers
Comparison fields: 5 of 42
- Mechanics of Materials 173
- Condensed Matter Physics 38
- Materials Chemistry 132
- Electronic, Optical and Magnetic Materials 52
- Electrical and Electronic Engineering 148
Countries citing papers authored by David A. Glocker
This map shows the geographic impact of David A. Glocker's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David A. Glocker with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David A. Glocker more than expected).
Fields of papers citing papers by David A. Glocker
This network shows the impact of papers produced by David A. Glocker. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David A. Glocker. The network helps show where David A. Glocker may publish in the future.
Co-authors
The 7 scholars most cited alongside David A. Glocker, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 25 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1993 | 83 | |
| 2 | 1989 | 51 | |
| 3 | 1977 | 26 | |
| 4 | 1969 | 23 | |
| 5 | 2001 | 16 | |
| 6 | 1986 | 15 | |
| 7 | 1988 | 13 | |
| 8 | Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering | 2017 | 13 |
| 9 | 2000 | 9 | |
| 10 | 1974 | 7 | |
| 11 | 1982 | 5 | |
| 12 | 1991 | 4 | |
| 13 | 2014 | 3 | |
| 14 | 1982 | 3 | |
| 15 | 1992 | 3 | |
| 16 | 2016 | 3 | |
| 17 | 1981 | 2 | |
| 18 | 2004 | 2 | |
| 19 | 1981 | 2 | |
| 20 | 1987 | 1 |
About David A. Glocker
David A. Glocker is a scholar working on Mechanics of Materials, Condensed Matter Physics, Computational Mechanics, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 25 papers that have together received 287 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (13 papers), GaN-based semiconductor devices and materials (5 papers), Ion-surface interactions and analysis (4 papers), Semiconductor materials and devices (4 papers), Optical Coatings and Gratings (3 papers), Diamond and Carbon-based Materials Research (3 papers), Acoustic Wave Resonator Technologies (3 papers) and Surface Roughness and Optical Measurements (2 papers). The work is most often cited by research in Mechanics of Materials (173 citations), Condensed Matter Physics (38 citations), Materials Chemistry (132 citations), Electronic, Optical and Magnetic Materials (52 citations) and Electrical and Electronic Engineering (148 citations). David A. Glocker has collaborated with scholars based in United States. Frequent co-authors include Mark A. Lewis, Jacob Jorné, M. J. Skove, R.L. Wiseman, J. W. Cook, Surendra K. Gupta and George W. Scherer. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Surface and Coatings Technology, Journal of Applied Physics, Applied Physics Letters and The Journal of Chemical Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.