Daniel Gall

213 papers receiving 10.0k citations

Daniel Gall's Hit Papers

The search for the most conductive metal for narrow interconnect lines 2020 · 259 citations
2590+3+6Years since publication200400600

Peers

Daniel Gall
Comparison fields: 5 of 75
  • Mechanics of Materials 4.8k
  • Electronic, Optical and Magnetic Materials 2.8k
  • Condensed Matter Physics 1.5k
  • Materials Chemistry 5.3k
  • Surfaces, Coatings and Films 583
Replace Eric Chason with:
Eric Chason United States
J.‐E. Sundgren Sweden
Ulf Helmersson Sweden
J. E. Greene United States
S. Anders United States
B Clemens United States
J. J. Cuomo United States
Carsten Ronning Germany
Jens Birch Sweden
J. C. Bravman United States
Daniel Gall relative to Eric Chason United States Eric Chason's profile →
Citations per field
00.5×4.7×
Eric Chason · 1×
Citations per year

Countries citing papers authored by Daniel Gall

Since Specialization
Citations

This map shows the geographic impact of Daniel Gall's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Daniel Gall with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Daniel Gall more than expected).

Fields of papers citing papers by Daniel Gall

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Daniel Gall. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Daniel Gall. The network helps show where Daniel Gall may publish in the future.

Co-authors

The 25 scholars most cited alongside Daniel Gall, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Daniel Gall Line = papers co-authored together Daniel Gall links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 220 papers — load more, or switch the sort, to bring in the rest.

#Work
1
Electron mean free path in elemental metals
Hit paper breakdown →
2016731
2 2003329
3
The search for the most conductive metal for narrow interconnect lines
Hit paper breakdown →
2020259
4 2018233
5 1998221
6 2011149
7 2003146
8 2005146
9 2001145
10 2009135
11 2008130
12 2005128
13 2014128
14 2002127
15 2004126
16 2001124
17 2002122
18 2003120
19 2015119
20 1998118

About Daniel Gall

Daniel Gall is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics, having authored 220 papers that have together received 10.2k indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (124 papers), Semiconductor materials and devices (103 papers), Copper Interconnects and Reliability (69 papers), MXene and MAX Phase Materials (37 papers), GaN-based semiconductor devices and materials (33 papers), Boron and Carbon Nanomaterials Research (29 papers), Diamond and Carbon-based Materials Research (24 papers) and Semiconductor materials and interfaces (20 papers). The work is most often cited by research in Mechanics of Materials (4.8k citations), Electronic, Optical and Magnetic Materials (2.8k citations), Condensed Matter Physics (1.5k citations), Materials Chemistry (5.3k citations) and Surfaces, Coatings and Films (583 citations). Daniel Gall has collaborated with scholars based in United States, China and Canada. Frequent co-authors include I. Petrov, S. V. Khare, J. E. Greene, Chris L. Mulligan, J. S. Chawla, C. M. Zhou, Karthik Balasubramanian, Cheung Soo Shin, J. E. Greene and S. V. Kesapragada. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Thin Solid Films, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Surface and Coatings Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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