D. Josell
Impact in
- Electrochemistry top 0.5%
- Electrochemical Analysis and Applications
-
- Copper Interconnects and Reliability
Papers in
-
- Electrodeposition and Electroless Coatings 71
- Semiconductor materials and devices 19
- Electronic Packaging and Soldering Technologies 17
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- Corrosion Behavior and Inhibition 19
- Co-authors
- Thomas P. Moffat (75 shared papers)Daniel Wheeler (24 shared papers)William Huber (4 shared papers)T. P. Moffat (4 shared papers)John E. Bonevich (16 shared papers)S.-K. Kim (4 shared papers)T. P. Moffat (7 shared papers)F. Spaepen (6 shared papers)
- Journals
- Journal of The Electrochemical Society (51 papers)Electrochemical and Solid-State Letters (8 papers)Journal of Applied Physics (7 papers)Journal of materials research/Pratt's guide to venture capital sources (7 papers)Materials Letters (4 papers)
- Partner nations
- United StatesSwitzerlandUnited Kingdom
In The Last Decade
D. Josell
155 papers receiving 4.9k citations
Peers
Comparison fields: 5 of 78
- Electrochemistry 795
- Electronic, Optical and Magnetic Materials 1.5k
- Electrical and Electronic Engineering 3.8k
- Materials Chemistry 2.2k
- Atomic and Molecular Physics, and Optics 1.0k
Countries citing papers authored by D. Josell
This map shows the geographic impact of D. Josell's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Josell with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Josell more than expected).
Fields of papers citing papers by D. Josell
This network shows the impact of papers produced by D. Josell. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Josell. The network helps show where D. Josell may publish in the future.
Co-authors
The 25 scholars most cited alongside D. Josell, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 161 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2000 | 353 | |
| 2 | 2005 | 320 | |
| 3 | 2001 | 277 | |
| 4 | 2009 | 231 | |
| 5 | 2012 | 173 | |
| 6 | 2007 | 143 | |
| 7 | 2006 | 127 | |
| 8 | 2003 | 120 | |
| 9 | 2001 | 116 | |
| 10 | 1988 | 115 | |
| 11 | 2005 | 98 | |
| 12 | 2012 | 95 | |
| 13 | 1993 | 90 | |
| 14 | 2003 | 90 | |
| 15 | 2006 | 86 | |
| 16 | 2001 | 75 | |
| 17 | 1996 | 75 | |
| 18 | 2013 | 67 | |
| 19 | 2018 | 67 | |
| 20 | 2003 | 61 |
About D. Josell
D. Josell is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Mechanics of Materials, having authored 161 papers that have together received 5.2k indexed citations. Recurring topics across this work include Electrodeposition and Electroless Coatings (71 papers), Copper Interconnects and Reliability (36 papers), Semiconductor materials and interfaces (27 papers), Corrosion Behavior and Inhibition (19 papers), Semiconductor materials and devices (19 papers), Electrochemical Analysis and Applications (17 papers), Electronic Packaging and Soldering Technologies (17 papers) and Metal and Thin Film Mechanics (16 papers). The work is most often cited by research in Electrochemistry (795 citations), Electronic, Optical and Magnetic Materials (1.5k citations), Electrical and Electronic Engineering (3.8k citations), Materials Chemistry (2.2k citations) and Atomic and Molecular Physics, and Optics (1.0k citations). D. Josell has collaborated with scholars based in United States, Switzerland and United Kingdom. Frequent co-authors include Thomas P. Moffat, Daniel Wheeler, William Huber, T. P. Moffat, John E. Bonevich, S.-K. Kim, T. P. Moffat, F. Spaepen, Monica D. Edelstein and D. Van Heerden. Their work appears in journals such as Journal of The Electrochemical Society, Electrochemical and Solid-State Letters, Journal of Applied Physics, Journal of materials research/Pratt's guide to venture capital sources and Materials Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.