D. C. Schram

1.4k citations

64 papers · 1.3k · h-index 21

Impact in

Mechanics of Materials top 2%
- Metal and Thin Film Mechanics
- Laser-induced spectroscopy and plasma
Electrical and Electronic Engineering top 5%
- Plasma Diagnostics and Applications
- Thin-Film Transistor Technologies

Papers in

Electrical and Electronic Engineering 46
- Plasma Diagnostics and Applications 29
- Thin-Film Transistor Technologies 10
Mechanics of Materials 34
- Laser-induced spectroscopy and plasma 17
- Metal and Thin Film Mechanics 16

Co-authors: M. C. M. van de Sanden (24 shared papers)W. M. M. Kessels (7 shared papers)R. Engeln (9 shared papers)J.A.M. van der Mullen (6 shared papers)Stéphane Mazouffre (3 shared papers)L.J. van IJzendoorn (4 shared papers)C.M. Leewis (1 shared paper)J.J.A.M. van der Mullen (1 shared paper)
Journals: Plasma Sources Science and Technology (7 papers)Journal of Applied Physics (5 papers)Thin Solid Films (3 papers)Journal of Physics D Applied Physics (3 papers)Spectrochimica Acta Part B Atomic Spectroscopy (2 papers)
Partner nations: Netherlands Germany Belgium

In The Last Decade

D. C. Schram

62 papers receiving 1.2k citations

Peers

Countries citing papers authored by D. C. Schram

Since Specialization

Citations

This map shows the geographic impact of D. C. Schram's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. C. Schram with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. C. Schram more than expected).

Fields of papers citing papers by D. C. Schram

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. C. Schram. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. C. Schram. The network helps show where D. C. Schram may publish in the future.

Co-authors

The 25 scholars most cited alongside D. C. Schram, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D. C. Schram Line = papers co-authored together D. C. Schram links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 64 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Optical and mechanical properties of plasma-beam-deposited amorphous hydrogenated carbon Journal of Applied Physics ·J.W.A.M. Gielen, P. R. M. Kleuskens, M. C. M. van de Sanden, L.J. van IJzendoorn, D. C. Schram, E.H.A. Dekempeneer, J. Meneve	1996	85
2	PLASIMO, a general model: I. Applied to an argon cascaded arc plasma Plasma Sources Science and Technology ·Guido Janssen, Jan van Dijk, D. A. Benoy, MA Tas, K. T. A. L. Burm, W. J. Goedheer, J.A.M. van der Mullen, D. C. Schram	1999	78
3	Detailed study of the plasma-activated catalytic generation of ammonia in N2-H2 plasmas Journal of Applied Physics ·J. H. van Helden, W. Wagemans, G Göksel Yagci, R. Zijlmans, D. C. Schram, R. Engeln, G. Lombardi, Gabi-Daniel Stancu, J. Röpcke	2007	74
4	The behaviour of heavy particles in the expanding plasma jet in argon Plasma Sources Science and Technology ·M. C. M. van de Sanden, J.M. De Regt, D. C. Schram	1994	74
5	Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth Journal of Applied Physics ·W. M. M. Kessels, C.M. Leewis, M. C. M. van de Sanden, D. C. Schram	1999	72
6	Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·W. M. M. Kessels, M. C. M. van de Sanden, D. C. Schram	2000	62
7	Flow dynamics and invasion by background gas of a supersonically expanding thermal plasma Plasma Sources Science and Technology ·R. Engeln, Stéphane Mazouffre, P. Vankan, D. C. Schram, N. Sadeghi	2001	60
8	Collisional Radiative Models in Plasmas TU/e Research Portal ·B. Der Van Sijde, J.J.A.M. van der Mullen, D. C. Schram	1984	54
9	An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications Applied Surface Science ·R. Groenen, J.L. Linden, H.R.M. van Lierop, D. C. Schram, A. Kuypers, M. C. M. van de Sanden	2001	53
10	Anomalous Atomic Hydrogen Shock Pattern in a Supersonic Plasma Jet Physical Review Letters ·Stéphane Mazouffre, M. G. H. Boogaarts, J. A. M. van der Mullen, D. C. Schram	2000	39
11	Langmuir probe measurements in an expanding magnetized plasma Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·G. J. H. Brussaard, Marianne van der Steen, Marcel Carrère, M. C. M. van de Sanden, D. C. Schram	1996	32
12	Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasma Plasma Chemistry and Plasma Processing ·G. M. W. Kroesen, D. C. Schram, M.J.F. van de Sande	1990	31
13	Components of continuum radiation in an inductively coupled plasma Journal of Physics D Applied Physics ·J.M. De Regt, Jan van Dijk, J.A.M. van der Mullen, D. C. Schram	1995	29
14	Dissociative recombination in cascaded arc generated Ar–N2 and N2 expanding plasma Physics of Plasmas ·R.P. Dahiya, M. J. de Graaf, R. J. Severens, H. Swelsen, M. C. M. van de Sanden, D. C. Schram	1994	29
15	Amorphous hydrogenated silicon films produced by an expanding argon-silane plasma investigated with spectroscopic IR ellipsometry Thin Solid Films ·A.T.M. Wilbers, G. J. Meeusen, M. Haverlag, G. M. W. Kroesen, D. C. Schram, Holger Kersten	1991	27
16	Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates Thin Solid Films ·A. de Graaf, Gheorghe Dinescu, J.L. Longueville, M. C. M. van de Sanden, D. C. Schram, E.H.A. Dekempeneer, L.J. van IJzendoorn	1998	27
17	Formation and relaxation of rovibrationally excitedH2molecules due to plasma-surface interaction Physical Review E ·O. Gabriel, D. C. Schram, R. Engeln	2008	26
18	Plasma processing and chemistry Pure and Applied Chemistry ·D. C. Schram	2002	24
19	A hollow cathode arc as a high intensity beam source for ground state and metastable noble gas atoms in the eV translational energy range Journal of Physics E Scientific Instruments ·P G A Theuws, H. C. W. Beijerinck, N.F. Verster, D. C. Schram	1982	24
20	Comparison of active and passive spectroscopic methods to investigate atmospheric inductively coupled plasmas Spectrochimica Acta Part B Atomic Spectroscopy ·J.M. De Regt, F.P.J. de Groote, J.A.M. van der Mullen, D. C. Schram	1996	23

About D. C. Schram

D. C. Schram is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Materials Chemistry, Atomic and Molecular Physics, and Optics and Radiology, Nuclear Medicine and Imaging, having authored 64 papers that have together received 1.3k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (29 papers), Laser-induced spectroscopy and plasma (17 papers), Metal and Thin Film Mechanics (16 papers), Diamond and Carbon-based Materials Research (14 papers), Thin-Film Transistor Technologies (10 papers), Silicon Nanostructures and Photoluminescence (8 papers), Plasma Applications and Diagnostics (8 papers) and Vacuum and Plasma Arcs (7 papers). The work is most often cited by research in Mechanics of Materials (437 citations), Electrical and Electronic Engineering (871 citations), Atomic and Molecular Physics, and Optics (425 citations), Radiology, Nuclear Medicine and Imaging (231 citations) and Materials Chemistry (524 citations). D. C. Schram has collaborated with scholars based in Netherlands, Germany and Belgium. Frequent co-authors include M. C. M. van de Sanden, W. M. M. Kessels, R. Engeln, J.A.M. van der Mullen, Stéphane Mazouffre, L.J. van IJzendoorn, C.M. Leewis, J.J.A.M. van der Mullen, E.H.A. Dekempeneer and G. M. W. Kroesen. Their work appears in journals such as Plasma Sources Science and Technology, Journal of Applied Physics, Thin Solid Films, Journal of Physics D Applied Physics and Spectrochimica Acta Part B Atomic Spectroscopy.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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D. C. Schram

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