Chenhua Ren
Impact in
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- Plasma Applications and Diagnostics
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- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Aerosol Filtration and Electrostatic Precipitation
- Electrostatic Discharge in Electronics
Papers in
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- Plasma Diagnostics and Applications 19
- Electrohydrodynamics and Fluid Dynamics 11
- Aerosol Filtration and Electrostatic Precipitation 6
- Chalcogenide Semiconductor Thin Films 1
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- Plasma Applications and Diagnostics 21
- Co-authors
- Pengying Jia (14 shared papers)Xuechen Li (14 shared papers)Kaiyue Wu (13 shared papers)Tao Shao (10 shared papers)Cheng Zhang (8 shared papers)Bangdou Huang (8 shared papers)Jiacun Wu (6 shared papers)Weijiang Chen (3 shared papers)
- Journals
- Physics of Plasmas (8 papers)Plasma Sources Science and Technology (5 papers)Journal of Physics D Applied Physics (3 papers)High Voltage (2 papers)Plasma Processes and Polymers (2 papers)
- Partner nations
- ChinaUnited StatesEthiopia
In The Last Decade
Chenhua Ren
27 papers receiving 291 citations
Peers
Comparison fields: 5 of 40
- Radiology, Nuclear Medicine and Imaging 231
- Electrical and Electronic Engineering 238
- Surfaces, Coatings and Films 15
- Aerospace Engineering 26
- Materials Chemistry 42
Countries citing papers authored by Chenhua Ren
This map shows the geographic impact of Chenhua Ren's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chenhua Ren with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chenhua Ren more than expected).
Fields of papers citing papers by Chenhua Ren
This network shows the impact of papers produced by Chenhua Ren. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chenhua Ren. The network helps show where Chenhua Ren may publish in the future.
Co-authors
The 25 scholars most cited alongside Chenhua Ren, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 28 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2019 | 37 | |
| 2 | 2022 | 22 | |
| 3 | 2023 | 22 | |
| 4 | 2023 | 22 | |
| 5 | 2021 | 17 | |
| 6 | 2020 | 16 | |
| 7 | 2023 | 15 | |
| 8 | 2020 | 15 | |
| 9 | 2019 | 14 | |
| 10 | 2022 | 13 | |
| 11 | 2018 | 11 | |
| 12 | 2023 | 10 | |
| 13 | 2020 | 10 | |
| 14 | 2020 | 10 | |
| 15 | 2018 | 9 | |
| 16 | 2021 | 8 | |
| 17 | 2019 | 8 | |
| 18 | 2023 | 7 | |
| 19 | 2024 | 7 | |
| 20 | 2023 | 7 |
About Chenhua Ren
Chenhua Ren is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging, Materials Chemistry, Mechanics of Materials and Atomic and Molecular Physics, and Optics, having authored 28 papers that have together received 308 indexed citations. Recurring topics across this work include Plasma Applications and Diagnostics (21 papers), Plasma Diagnostics and Applications (19 papers), Electrohydrodynamics and Fluid Dynamics (11 papers), Aerosol Filtration and Electrostatic Precipitation (6 papers), High voltage insulation and dielectric phenomena (4 papers), Surface Modification and Superhydrophobicity (2 papers), Chalcogenide Semiconductor Thin Films (1 paper) and Metal and Thin Film Mechanics (1 paper). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (231 citations), Electrical and Electronic Engineering (238 citations), Surfaces, Coatings and Films (15 citations), Aerospace Engineering (26 citations) and Materials Chemistry (42 citations). Chenhua Ren has collaborated with scholars based in China, United States and Ethiopia. Frequent co-authors include Pengying Jia, Xuechen Li, Kaiyue Wu, Tao Shao, Cheng Zhang, Bangdou Huang, Jiacun Wu, Weijiang Chen, Bo Qi and Junxia Ran. Their work appears in journals such as Physics of Plasmas, Plasma Sources Science and Technology, Journal of Physics D Applied Physics, High Voltage and Plasma Processes and Polymers.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.