C.H. Shon

532 citations
14 papers · 446 · h-index 10

Impact in

Papers in

C.H. Shon

14 papers receiving 423 citations

Peers

C.H. Shon
Comparison fields: 5 of 50
  • Radiology, Nuclear Medicine and Imaging 228
  • Electrical and Electronic Engineering 330
  • Structural Biology 6
  • Surfaces, Coatings and Films 27
  • Mechanics of Materials 94
Replace A J Flikweert with:
A J Flikweert Netherlands
Masaaki Kanoh Japan
Zhong-Ling Dai China
J. W. Shon South Korea
Manabu Hamagaki Japan
Yixiao Zhou China
Tsutomu Tsukada Japan
E.G. Finanţu-Dinu Germany
Junxia Ran China
Ken Golby United States
C.H. Shon relative to A J Flikweert Netherlands A J Flikweert's profile →
Citations per field
00.5×1.5×
A J Flikweert · 1×
Citations per year

Countries citing papers authored by C.H. Shon

Since Specialization
Citations

This map shows the geographic impact of C.H. Shon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C.H. Shon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C.H. Shon more than expected).

Fields of papers citing papers by C.H. Shon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C.H. Shon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C.H. Shon. The network helps show where C.H. Shon may publish in the future.

Co-authors

The 16 scholars most cited alongside C.H. Shon, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C.H. Shon Line = papers co-authored together C.H. Shon links everyone, so they are left out of the graph.

All Works

14 of 14 papers shown
#Work
1 2009174
2 200272
3 199836
4 199934
5 200131
6 200421
7 199920
8 200113
9 200912
10 199911
11 199910
12 20076
13 20013
14 19993

About C.H. Shon

C.H. Shon is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 14 papers that have together received 446 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (10 papers), Copper Interconnects and Reliability (4 papers), High voltage insulation and dielectric phenomena (3 papers), Metal and Thin Film Mechanics (3 papers), Dust and Plasma Wave Phenomena (3 papers), Plasma Applications and Diagnostics (2 papers), Semiconductor materials and devices (2 papers) and Magnetic confinement fusion research (2 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (228 citations), Electrical and Electronic Engineering (330 citations), Structural Biology (6 citations), Surfaces, Coatings and Films (27 citations) and Mechanics of Materials (94 citations). C.H. Shon has collaborated with scholars based in South Korea, United Kingdom and Japan. Frequent co-authors include Sangil Kim, G.C. Kim, Hong Joo Lee, Michael G. Kong, Jae Koo Lee, Toshiaki Makabe, Tae Hun Chung, Yun Yang, Hae Young Choi and Jong Uk Kim. Their work appears in journals such as IEEE Transactions on Plasma Science, Japanese Journal of Applied Physics, Computer Physics Communications, Physics of Plasmas and Applied Surface Science.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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