A. Heft

705 citations
26 papers · 628 · h-index 15

Impact in

Papers in

    • Semiconductor materials and devices 9
    • Silicon Carbide Semiconductor Technologies 7
    • Gas Sensing Nanomaterials and Sensors 5
    • Integrated Circuits and Semiconductor Failure Analysis 4
    • Thin-Film Transistor Technologies 4
    • ZnO doping and properties 7
    • Copper-based nanomaterials and applications 4

A. Heft

24 papers receiving 618 citations

Peers

A. Heft
Comparison fields: 5 of 52
  • Ceramics and Composites 128
  • Electrical and Electronic Engineering 447
  • Computational Mechanics 127
  • Materials Chemistry 242
  • Surfaces, Coatings and Films 35
Replace Paul‐Tiberiu Miclea with:
Paul‐Tiberiu Miclea Germany
M. A. Fardad Canada
C. A. Achete Brazil
Xinguang Xu China
M. W. Stoker United States
P. Vitanov Bulgaria
Jingxiao Lu China
Din-Guo Chen United States
Ann Rose Abraham India
S Kitova Bulgaria
A. Heft relative to Paul‐Tiberiu Miclea Germany Paul‐Tiberiu Miclea's profile →
Citations per field
00.5×1.5×2.1×
Paul‐Tiberiu Miclea · 1×
Citations per year

Countries citing papers authored by A. Heft

Since Specialization
Citations

This map shows the geographic impact of A. Heft's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Heft with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Heft more than expected).

Fields of papers citing papers by A. Heft

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Heft. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Heft. The network helps show where A. Heft may publish in the future.

Co-authors

The 25 scholars most cited alongside A. Heft, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with A. Heft Line = papers co-authored together A. Heft links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 26 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1998185
2 199540
3 199540
4 199637
5 200534
6 201131
7 199531
8 199627
9 201223
10 201122
11 199720
12 201020
13 201119
14 201815
15 200714
16 199814
17 199912
18 200611
19 201410
20 20169

About A. Heft

A. Heft is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Computational Mechanics, Surfaces, Coatings and Films and Polymers and Plastics, having authored 26 papers that have together received 628 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), Silicon Carbide Semiconductor Technologies (7 papers), ZnO doping and properties (7 papers), Gas Sensing Nanomaterials and Sensors (5 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers), Thin-Film Transistor Technologies (4 papers), Copper-based nanomaterials and applications (4 papers) and Surface Modification and Superhydrophobicity (3 papers). The work is most often cited by research in Ceramics and Composites (128 citations), Electrical and Electronic Engineering (447 citations), Computational Mechanics (127 citations), Materials Chemistry (242 citations) and Surfaces, Coatings and Films (35 citations). A. Heft has collaborated with scholars based in Germany, Italy and United States. Frequent co-authors include W. Wesch, E. Wendler, E. Glaser, T. Bachmann, Andreas Pfuch, H. P. Strunk, J. Heindl, K.-D. Lang, A. Schimanski and Heinrich Lang. Their work appears in journals such as Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Thin Solid Films, Surface and Coatings Technology, Materials Science and Engineering B and Inorganica Chimica Acta.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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