Plasma Chemistry and Plasma Processing

2.2k papers and 48.9k indexed citations i.

The 2.2k papers published in Plasma Chemistry and Plasma Processing in the last decades have received a total of 48.9k indexed citations. Papers published in Plasma Chemistry and Plasma Processing usually cover Electrical and Electronic Engineering (1.2k papers), Radiology, Nuclear Medicine and Imaging (1.0k papers) and Materials Chemistry (834 papers) specifically the topics of Plasma Applications and Diagnostics (1.0k papers), Plasma Diagnostics and Applications (716 papers) and Catalytic Processes in Materials Science (462 papers). The most active scholars publishing in Plasma Chemistry and Plasma Processing are E. Pfender, P. Fauchais, Anthony B. Murphy, Maher I. Boulos and J. Heberlein