Institute of High Current Electronics
Impact in
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- Gyrotron and Vacuum Electronics Research
- Vacuum and Plasma Arcs
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- Pulsed Power Technology Applications
Papers in
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- Metal and Thin Film Mechanics 803
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- Gyrotron and Vacuum Electronics Research 546
- Vacuum and Plasma Arcs 543
- Top scholars
- В. Ф. ТарасенкоЕ. М. OksYu. F. IvanovG. Yu. YushkovВ. В. РостовV. I. OreshkinМ. И. ЛомаевAndré Anders
- Journals
- IEEE Transactions on Plasma Science (191 papers)Review of Scientific Instruments (109 papers)Physics of Plasmas (93 papers)Vacuum (60 papers)Surface and Coatings Technology (56 papers)
- Partner nations
- RussiaUnited StatesChina
In The Last Decade
Institute of High Current Electronics
3.4k papers receiving 34.7k citations
Peers
Comparison fields: 5 of 171
- Atomic and Molecular Physics, and Optics 12.9k
- Control and Systems Engineering 9.7k
- Radiology, Nuclear Medicine and Imaging 7.7k
- Mechanics of Materials 8.6k
- Electrical and Electronic Engineering 17.1k
Countries citing scholars working at Institute of High Current Electronics
This map shows the geographic impact of research produced by authors working at Institute of High Current Electronics. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers produced at Institute of High Current Electronics with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Institute of High Current Electronics more than expected).
Fields of papers published by authors at Institute of High Current Electronics
This network shows the impact of papers affiliated with Institute of High Current Electronics at the time of their publication. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers affiliated with Institute of High Current Electronics at the time of their publication.
About Institute of High Current Electronics
In recent decades, authors affiliated with Institute of High Current Electronics have published 3.8k papers, which have received a total of 35.1k indexed citations . Scholars at this organization have produced 1.1k papers in Mechanics of Materials, 1.3k papers in Atomic and Molecular Physics, and Optics, 939 papers in Control and Systems Engineering, 730 papers in Radiology, Nuclear Medicine and Imaging and 1.8k papers in Electrical and Electronic Engineering on the topics of Pulsed Power Technology Applications (934 papers), Metal and Thin Film Mechanics (803 papers), Plasma Applications and Diagnostics (723 papers), Plasma Diagnostics and Applications (706 papers), Gyrotron and Vacuum Electronics Research (546 papers), Vacuum and Plasma Arcs (543 papers), Laser Design and Applications (525 papers) and Diamond and Carbon-based Materials Research (309 papers). Their work is cited by papers focused on Atomic and Molecular Physics, and Optics (12.9k citations), Control and Systems Engineering (9.7k citations), Radiology, Nuclear Medicine and Imaging (7.7k citations), Mechanics of Materials (8.6k citations) and Electrical and Electronic Engineering (17.1k citations). Authors at Institute of High Current Electronics collaborate with scholars in Russia, United States and China and have published in prestigious journals including IEEE Transactions on Plasma Science, Review of Scientific Instruments, Physics of Plasmas, Vacuum and Surface and Coatings Technology. Some of Institute of High Current Electronics's most productive authors include В. Ф. Тарасенко, Е. М. Oks, Yu. F. Ivanov, G. Yu. Yushkov, В. В. Ростов, V. I. Oreshkin, М. И. Ломаев, André Anders, N. N. Koval and D.I. Proskurovsky.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.