T.‐M. Lu
Impact in
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- Advanced Fiber Laser Technologies
- Magnetic properties of thin films
- Surface and Thin Film Phenomena
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- Copper Interconnects and Reliability
Papers in
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- Copper Interconnects and Reliability 19
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- Semiconductor materials and devices 34
- Co-authors
- Yiping Zhao (5 shared papers)G.-C. Wang (3 shared papers)Pulickel Madhavapanicker Ajayan (2 shared papers)X.-C. Zhang (1 shared paper)Linda S. Schadler (1 shared paper)Nachiket Raravikar (1 shared paper)James Alexander Moore (4 shared papers)G.‐R. Yang (13 shared papers)
- Journals
- Applied Physics Letters (15 papers)Journal of Applied Physics (14 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)Journal of The Electrochemical Society (2 papers)Thin Solid Films (2 papers)
- Partner nations
- United StatesChinaCanada
In The Last Decade
T.‐M. Lu
75 papers receiving 1.5k citations
Peers
Comparison fields: 5 of 65
- Atomic and Molecular Physics, and Optics 646
- Electronic, Optical and Magnetic Materials 372
- Surfaces, Coatings and Films 123
- Materials Chemistry 635
- Electrical and Electronic Engineering 783
Countries citing papers authored by T.‐M. Lu
This map shows the geographic impact of T.‐M. Lu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T.‐M. Lu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T.‐M. Lu more than expected).
Fields of papers citing papers by T.‐M. Lu
This network shows the impact of papers produced by T.‐M. Lu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T.‐M. Lu. The network helps show where T.‐M. Lu may publish in the future.
Co-authors
The 25 scholars most cited alongside T.‐M. Lu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 81 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 368 | |
| 2 | 2001 | 164 | |
| 3 | 1992 | 97 | |
| 4 | 1984 | 47 | |
| 5 | 2015 | 45 | |
| 6 | 1987 | 45 | |
| 7 | 2001 | 44 | |
| 8 | 1994 | 33 | |
| 9 | 1997 | 33 | |
| 10 | 2004 | 32 | |
| 11 | 2007 | 30 | |
| 12 | 2001 | 29 | |
| 13 | 1994 | 29 | |
| 14 | 1991 | 29 | |
| 15 | 1998 | 27 | |
| 16 | 1988 | 27 | |
| 17 | 1995 | 26 | |
| 18 | 1992 | 25 | |
| 19 | 1991 | 24 | |
| 20 | 2017 | 22 |
About T.‐M. Lu
T.‐M. Lu is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Mechanics of Materials and Materials Chemistry, having authored 81 papers that have together received 1.6k indexed citations. Recurring topics across this work include Semiconductor materials and devices (34 papers), Copper Interconnects and Reliability (19 papers), Metal and Thin Film Mechanics (15 papers), nanoparticles nucleation surface interactions (8 papers), Semiconductor materials and interfaces (8 papers), Ion-surface interactions and analysis (8 papers), Surface and Thin Film Phenomena (6 papers) and Advanced Chemical Physics Studies (6 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (646 citations), Electronic, Optical and Magnetic Materials (372 citations), Surfaces, Coatings and Films (123 citations), Materials Chemistry (635 citations) and Electrical and Electronic Engineering (783 citations). T.‐M. Lu has collaborated with scholars based in United States, China and Canada. Frequent co-authors include Yiping Zhao, G.-C. Wang, Pulickel Madhavapanicker Ajayan, X.-C. Zhang, Linda S. Schadler, Nachiket Raravikar, James Alexander Moore, G.‐R. Yang, Joseph M. Pimbley and George Palasantzas. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of The Electrochemical Society and Thin Solid Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.