T.‐M. Lu
About
T.‐M. Lu has authored 71 papers that have received a total of 1.4k indexed citations.
This includes 45 papers in Electrical and Electronic Engineering, 26 papers in Atomic and Molecular Physics, and Optics and 21 papers in Electronic, Optical and Magnetic Materials. The topics of these papers are Semiconductor materials and devices (32 papers), Copper Interconnects and Reliability (16 papers) and Metal and Thin Film Mechanics (15 papers). T.‐M. Lu is often cited by papers focused on Semiconductor materials and devices (32 papers), Copper Interconnects and Reliability (16 papers) and Metal and Thin Film Mechanics (15 papers) and collaborates with scholars based in United States, China and Taiwan. T.‐M. Lu's co-authors include G.‐R. Yang, J. F. McDonald, Yiping Zhao, Eugene J. Rymaszewski and Lü You and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
In The Last Decade
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