J. Cha
Impact in
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- Plasma Applications and Diagnostics
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- Surface Modification and Superhydrophobicity
Papers in
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- Plasma Diagnostics and Applications 13
- Electrohydrodynamics and Fluid Dynamics 4
- Semiconductor materials and devices 2
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- Metal and Thin Film Mechanics 8
- Co-authors
- Ho Jun Lee (1 shared paper)T. H. Chung (1 shared paper)Hea Min Joh (1 shared paper)Sun Ja Kim (1 shared paper)Joo‐Ho Lee (4 shared papers)Sang‐Woo Kim (3 shared papers)J. E. Mazur (1 shared paper)Dong‐Hyun Kim (3 shared papers)
- Journals
- Applied Sciences (4 papers)Journal of Physics D Applied Physics (3 papers)IEEE Transactions on Plasma Science (2 papers)AIP Advances (2 papers)Japanese Journal of Applied Physics (2 papers)
- Partner nations
- South KoreaUnited States
In The Last Decade
J. Cha
20 papers receiving 127 citations
Peers
Comparison fields: 5 of 28
- Radiology, Nuclear Medicine and Imaging 42
- Surfaces, Coatings and Films 14
- Astronomy and Astrophysics 30
- Electrical and Electronic Engineering 73
- Aerospace Engineering 23
Countries citing papers authored by J. Cha
This map shows the geographic impact of J. Cha's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Cha with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Cha more than expected).
Fields of papers citing papers by J. Cha
This network shows the impact of papers produced by J. Cha. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Cha. The network helps show where J. Cha may publish in the future.
Co-authors
The 25 scholars most cited alongside J. Cha, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 26 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2012 | 32 | |
| 2 | 2015 | 31 | |
| 3 | 2010 | 16 | |
| 4 | 2021 | 8 | |
| 5 | 2014 | 8 | |
| 6 | 2017 | 6 | |
| 7 | 2021 | 5 | |
| 8 | 2023 | 4 | |
| 9 | 2020 | 4 | |
| 10 | 2021 | 4 | |
| 11 | 2012 | 3 | |
| 12 | 2020 | 3 | |
| 13 | Energy-controlled Micro Electrical Discharge Machining for an Al2O3-carbon Nanotube Composite | 2017 | 2 |
| 14 | The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma | 2017 | 2 |
| 15 | NEW FORMULAS FOR THE REFLECTION COEFFI- CIENT OF AN OPEN-ENDED RECTANGULAR WAVEG- UIDE RADIATING INTO AIR INCLUDING THE EFFECT OF WALL THICKNESS OR FLANGE | 2010 | 2 |
| 16 | 2025 | 1 | |
| 17 | 2023 | 1 | |
| 18 | 2020 | 1 | |
| 19 | 2025 | 1 | |
| 20 | 1995 | 1 |
About J. Cha
J. Cha is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Radiology, Nuclear Medicine and Imaging, Atomic and Molecular Physics, and Optics and Aerospace Engineering, having authored 26 papers that have together received 135 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (13 papers), Metal and Thin Film Mechanics (8 papers), Plasma Applications and Diagnostics (6 papers), Electrohydrodynamics and Fluid Dynamics (4 papers), Ionosphere and magnetosphere dynamics (2 papers), Surface Modification and Superhydrophobicity (2 papers), Semiconductor materials and devices (2 papers) and Astrophysics and Cosmic Phenomena (2 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (42 citations), Surfaces, Coatings and Films (14 citations), Astronomy and Astrophysics (30 citations), Electrical and Electronic Engineering (73 citations) and Aerospace Engineering (23 citations). J. Cha has collaborated with scholars based in South Korea and United States. Frequent co-authors include Ho Jun Lee, T. H. Chung, Hea Min Joh, Sun Ja Kim, Joo‐Ho Lee, Sang‐Woo Kim, J. E. Mazur, Dong‐Hyun Kim, N. Katz and J. B. Blake. Their work appears in journals such as Applied Sciences, Journal of Physics D Applied Physics, IEEE Transactions on Plasma Science, AIP Advances and Japanese Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.