C. Courteille
Impact in
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- Dust and Plasma Wave Phenomena
- Atomic and Molecular Physics
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- Plasma Diagnostics and Applications
- Thin-Film Transistor Technologies
Papers in
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- Plasma Diagnostics and Applications 13
- Electrostatic Discharge in Electronics 4
- Gas Sensing Nanomaterials and Sensors 2
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- Dust and Plasma Wave Phenomena 8
- Atomic and Molecular Physics 2
- Co-authors
- Ch. Hollenstein (9 shared papers)A.A. Howling (9 shared papers)M. Bacal (6 shared papers)J.-L. Dorier (5 shared papers)L. Sansonnens (4 shared papers)W. Schwarzenbach (4 shared papers)A. M. Bruneteau (3 shared papers)R. Leroy (5 shared papers)
- Journals
- Review of Scientific Instruments (4 papers)Journal of Applied Physics (2 papers)Journal of Physics D Applied Physics (1 paper)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (1 paper)Pure and Applied Chemistry (1 paper)
- Partner nations
- FranceSwitzerlandNetherlands
In The Last Decade
C. Courteille
17 papers receiving 442 citations
Peers
Comparison fields: 5 of 38
- Atomic and Molecular Physics, and Optics 234
- Electrical and Electronic Engineering 289
- Aerospace Engineering 106
- Materials Chemistry 166
- Nuclear and High Energy Physics 42
Countries citing papers authored by C. Courteille
This map shows the geographic impact of C. Courteille's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Courteille with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Courteille more than expected).
Fields of papers citing papers by C. Courteille
This network shows the impact of papers produced by C. Courteille. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Courteille. The network helps show where C. Courteille may publish in the future.
Co-authors
The 25 scholars most cited alongside C. Courteille, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1996 | 88 | |
| 2 | 1996 | 66 | |
| 3 | 1995 | 56 | |
| 4 | 1998 | 47 | |
| 5 | 1996 | 41 | |
| 6 | 1996 | 30 | |
| 7 | 1993 | 29 | |
| 8 | 1995 | 21 | |
| 9 | 1993 | 20 | |
| 10 | 1998 | 19 | |
| 11 | 1992 | 18 | |
| 12 | 1996 | 7 | |
| 13 | 1996 | 6 | |
| 14 | 1992 | 3 | |
| 15 | 1998 | 2 | |
| 16 | 1994 | 2 | |
| 17 | 1991 | 2 |
About C. Courteille
C. Courteille is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Aerospace Engineering, Astronomy and Astrophysics and Mechanics of Materials, having authored 17 papers that have together received 457 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (13 papers), Dust and Plasma Wave Phenomena (8 papers), Particle accelerators and beam dynamics (6 papers), Electrostatic Discharge in Electronics (4 papers), Laser-induced spectroscopy and plasma (2 papers), Atomic and Molecular Physics (2 papers), High-pressure geophysics and materials (2 papers) and Gas Sensing Nanomaterials and Sensors (2 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (234 citations), Electrical and Electronic Engineering (289 citations), Aerospace Engineering (106 citations), Materials Chemistry (166 citations) and Nuclear and High Energy Physics (42 citations). C. Courteille has collaborated with scholars based in France, Switzerland and Netherlands. Frequent co-authors include Ch. Hollenstein, A.A. Howling, M. Bacal, J.-L. Dorier, L. Sansonnens, W. Schwarzenbach, A. M. Bruneteau, R. Leroy, G. Viera and A. Maçarico. Their work appears in journals such as Review of Scientific Instruments, Journal of Applied Physics, Journal of Physics D Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Pure and Applied Chemistry.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.