C. Barratt

654 citations
19 papers · 542 · h-index 11

Impact in

Papers in

    • Semiconductor materials and devices 14
    • Plasma Diagnostics and Applications 8
    • Silicon Carbide Semiconductor Technologies 2
    • Advancements in Semiconductor Devices and Circuit Design 2
    • Electrostatic Discharge in Electronics 2
    • GaN-based semiconductor devices and materials 6

C. Barratt

19 papers receiving 519 citations

Peers

C. Barratt
Comparison fields: 5 of 21
  • Condensed Matter Physics 297
  • Electrical and Electronic Engineering 454
  • Mechanics of Materials 116
  • Electronic, Optical and Magnetic Materials 73
  • Atomic and Molecular Physics, and Optics 113
Replace G. F. McLane with:
G. F. McLane United States
Z. Liliental-Weber United States
D. A. Vanderwater United States
A. Weimar Germany
C.J. Deatcher United Kingdom
Yoshiharu Yamauchi Japan
J. Sewell United States
Toshiyuki Tanahashi Japan
Z-Q. Fang United States
A. J. Ptak United States
C. Barratt relative to G. F. McLane United States G. F. McLane's profile →
Citations per field
00.5×6.5×
G. F. McLane · 1×
Citations per year

Countries citing papers authored by C. Barratt

Since Specialization
Citations

This map shows the geographic impact of C. Barratt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Barratt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Barratt more than expected).

Fields of papers citing papers by C. Barratt

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Barratt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Barratt. The network helps show where C. Barratt may publish in the future.

Co-authors

The 25 scholars most cited alongside C. Barratt, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Barratt Line = papers co-authored together C. Barratt links everyone, so they are left out of the graph.

All Works

19 of 19 papers shown
#Work
1 1996189
2 199798
3 199651
4 199238
5 199630
6 199225
7 199718
8 199318
9 199717
10 199713
11 199712
12 19978
13 19977
14 19965
15 19985
16 19944
17 19832
18 19951
19
Development and Ramping of pHEMT in an "HBT Fab"
20071

About C. Barratt

C. Barratt is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics, Materials Chemistry, Atomic and Molecular Physics, and Optics and Mechanics of Materials, having authored 19 papers that have together received 542 indexed citations. Recurring topics across this work include Semiconductor materials and devices (14 papers), Plasma Diagnostics and Applications (8 papers), GaN-based semiconductor devices and materials (6 papers), ZnO doping and properties (3 papers), Metal and Thin Film Mechanics (2 papers), Silicon Carbide Semiconductor Technologies (2 papers), Advancements in Semiconductor Devices and Circuit Design (2 papers) and Electrostatic Discharge in Electronics (2 papers). The work is most often cited by research in Condensed Matter Physics (297 citations), Electrical and Electronic Engineering (454 citations), Mechanics of Materials (116 citations), Electronic, Optical and Magnetic Materials (73 citations) and Atomic and Molecular Physics, and Optics (113 citations). C. Barratt has collaborated with scholars based in United States. Frequent co-authors include C. Constantine, S. J. Pearton, R. J. Shul, G McClellan, C. R. Abernathy, D. J. Rieger, F. Ren, J. W. Lee, R. F. Karlicek and S.A. Casalnuovo. Their work appears in journals such as Electronics Letters, Applied Physics Letters, Solid-State Electronics, Journal of The Electrochemical Society and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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