A. Wendt
Impact in
- Mechanics of Materials top 1%
- Metal and Thin Film Mechanics
- Laser-induced spectroscopy and plasma
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- Plasma Diagnostics and Applications
- Semiconductor materials and devices
- Electrohydrodynamics and Fluid Dynamics
Papers in
-
- Plasma Diagnostics and Applications 50
- Semiconductor materials and devices 15
-
- Metal and Thin Film Mechanics 22
- Laser-induced spectroscopy and plasma 13
- Co-authors
- John B. Boffard (12 shared papers)Chun C. Lin (12 shared papers)Robert Jung (5 shared papers)M. A. Lieberman (2 shared papers)Paul F. Nealey (4 shared papers)H. Meuth (1 shared paper)Chi‐Chun Liu (2 shared papers)J. A. Meyer (5 shared papers)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (13 papers)Plasma Sources Science and Technology (10 papers)Journal of Applied Physics (8 papers)Applied Physics Letters (4 papers)IEEE Transactions on Plasma Science (3 papers)
- Partner nations
- United StatesGermanySweden
In The Last Decade
A. Wendt
74 papers receiving 1.9k citations
Peers
Comparison fields: 5 of 87
- Mechanics of Materials 853
- Electrical and Electronic Engineering 1.6k
- Surfaces, Coatings and Films 94
- Radiology, Nuclear Medicine and Imaging 298
- Atomic and Molecular Physics, and Optics 350
Countries citing papers authored by A. Wendt
This map shows the geographic impact of A. Wendt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Wendt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Wendt more than expected).
Fields of papers citing papers by A. Wendt
This network shows the impact of papers produced by A. Wendt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Wendt. The network helps show where A. Wendt may publish in the future.
Co-authors
The 25 scholars most cited alongside A. Wendt, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 76 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2000 | 137 | |
| 2 | 2009 | 112 | |
| 3 | 1994 | 108 | |
| 4 | 1988 | 88 | |
| 5 | 2010 | 87 | |
| 6 | 2008 | 82 | |
| 7 | 2007 | 80 | |
| 8 | 2010 | 74 | |
| 9 | 2007 | 65 | |
| 10 | 2001 | 64 | |
| 11 | 2007 | 60 | |
| 12 | 2010 | 53 | |
| 13 | 1990 | 51 | |
| 14 | 1994 | 49 | |
| 15 | 2009 | 45 | |
| 16 | 1996 | 45 | |
| 17 | 2012 | 43 | |
| 18 | 2011 | 43 | |
| 19 | 2002 | 42 | |
| 20 | 2001 | 40 |
About A. Wendt
A. Wendt is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics and Aerospace Engineering, having authored 76 papers that have together received 2.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (50 papers), Metal and Thin Film Mechanics (22 papers), Semiconductor materials and devices (15 papers), Laser-induced spectroscopy and plasma (13 papers), Copper Interconnects and Reliability (10 papers), Particle accelerators and beam dynamics (10 papers), Plasma Applications and Diagnostics (7 papers) and Atomic and Molecular Physics (5 papers). The work is most often cited by research in Mechanics of Materials (853 citations), Electrical and Electronic Engineering (1.6k citations), Surfaces, Coatings and Films (94 citations), Radiology, Nuclear Medicine and Imaging (298 citations) and Atomic and Molecular Physics, and Optics (350 citations). A. Wendt has collaborated with scholars based in United States, Germany and Sweden. Frequent co-authors include John B. Boffard, Chun C. Lin, Robert Jung, M. A. Lieberman, Paul F. Nealey, H. Meuth, Chi‐Chun Liu, J. A. Meyer, J. L. Shohet and L.J. Mahoney. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Plasma Sources Science and Technology, Journal of Applied Physics, Applied Physics Letters and IEEE Transactions on Plasma Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.