A. R. Neureuther
About
A. R. Neureuther has authored 57 papers that have received a total of 826 indexed citations.
This includes 52 papers in Electrical and Electronic Engineering, 31 papers in Surfaces, Coatings and Films and 7 papers in Atomic and Molecular Physics, and Optics. The topics of these papers are Advancements in Photolithography Techniques (43 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). A. R. Neureuther is often cited by papers focused on Advancements in Photolithography Techniques (43 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers) and collaborates with scholars based in United States, Italy and South Korea. A. R. Neureuther's co-authors include Patrick Naulleau, C. H. Ting, N.W. Cheung, Kenneth A. Goldberg and Robert Socha and has published in prestigious journals such as Applied Physics Letters, Proceedings of the IEEE and IEEE Transactions on Electron Devices.
In The Last Decade
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