Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology

364 papers and 7.0k indexed citations i.

About

In recent decades, authors affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology have published 364 papers, which have received a total of 7.0k indexed citations. Scholars at this organization have produced 181 papers in Electrical and Electronic Engineering, 133 papers in Materials Chemistry and 106 papers in Mechanics of Materials on the topics of Metal and Thin Film Mechanics (98 papers), Semiconductor materials and devices (45 papers) and Diamond and Carbon-based Materials Research (44 papers). Their work is cited by papers focused on Electrical and Electronic Engineering (3.9k citations), Materials Chemistry (3.1k citations) and Mechanics of Materials (1.6k citations). Authors at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology collaborate with scholars in Germany, The Netherlands and United States and have published in prestigious journals including Science, Angewandte Chemie International Edition and Advanced Materials. Some of Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology's most productive authors include Matthias Fahland, O. Zywitzki, K. Goedicke, Peter Frach, C. Charton, Hagen Bartzsch, John Fahlteich, Fred Fietzke, N. Schiller and Elizabeth von Hauff.

In The Last Decade

Fields of papers published by authors at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology at the time of their publication. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology at the time of their publication.

Countries citing scholars working at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology

Since Specialization
Citations

This map shows the geographic impact of research produced by authors working at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers produced at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology more than expected).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar’s output or impact.

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