Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology
Impact in
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- Conducting polymers and applications
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- Semiconductor materials and devices
- Organic Electronics and Photovoltaics
- Organic Light-Emitting Diodes Research
- Thin-Film Transistor Technologies
Papers in
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- Metal and Thin Film Mechanics 107
- Top scholars
- Olaf ZywitzkiMatthias FahlandKlaus GoedickePeter FrachC. ChartonHagen BartzschElizabeth von HauffJohn Fahlteich
- Journals
- Surface and Coatings Technology (95 papers)Thin Solid Films (29 papers)physica status solidi (a) (6 papers)Plasma Processes and Polymers (6 papers)Japanese Journal of Applied Physics (5 papers)
- Partner nations
- GermanyNetherlandsUnited States
In The Last Decade
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology
417 papers receiving 8.4k citations
Peers
Comparison fields: 5 of 148
- Polymers and Plastics 1.2k
- Electrical and Electronic Engineering 4.7k
- Materials Chemistry 3.5k
- Mechanics of Materials 1.7k
- Surfaces, Coatings and Films 444
Countries citing scholars working at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology
This map shows the geographic impact of research produced by authors working at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers produced at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology more than expected).
Fields of papers published by authors at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology
This network shows the impact of papers affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology at the time of their publication. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology at the time of their publication.
About Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology
In recent decades, authors affiliated with Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology have published 444 papers, which have received a total of 8.6k indexed citations . Scholars at this organization have produced 45 papers in Surfaces, Coatings and Films, 116 papers in Mechanics of Materials, 219 papers in Electrical and Electronic Engineering, 148 papers in Materials Chemistry and 16 papers in Bioengineering on the topics of Metal and Thin Film Mechanics (107 papers), Semiconductor materials and devices (51 papers), Diamond and Carbon-based Materials Research (48 papers), ZnO doping and properties (42 papers), Thin-Film Transistor Technologies (38 papers), Acoustic Wave Resonator Technologies (28 papers), Organic Light-Emitting Diodes Research (28 papers) and GaN-based semiconductor devices and materials (28 papers). Their work is cited by papers focused on Polymers and Plastics (1.2k citations), Electrical and Electronic Engineering (4.7k citations), Materials Chemistry (3.5k citations), Mechanics of Materials (1.7k citations) and Surfaces, Coatings and Films (444 citations). Authors at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology collaborate with scholars in Germany, Netherlands and United States and have published in prestigious journals including Surface and Coatings Technology, Thin Solid Films, physica status solidi (a), Plasma Processes and Polymers and Japanese Journal of Applied Physics. Some of Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology's most productive authors include Olaf Zywitzki, Matthias Fahland, Klaus Goedicke, Peter Frach, C. Charton, Hagen Bartzsch, Elizabeth von Hauff, John Fahlteich, Fred Fietzke and Thomas Modes.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.