Eiichi Nishimura

62 papers receiving 530 citations

Peers

Eiichi Nishimura
Comparison fields: 5 of 75
  • Ophthalmology 66
  • Surfaces, Coatings and Films 54
  • Electrical and Electronic Engineering 321
  • Urology 28
  • Electronic, Optical and Magnetic Materials 66
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Citations per year

Countries citing papers authored by Eiichi Nishimura

Since Specialization
Citations

This map shows the geographic impact of Eiichi Nishimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eiichi Nishimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eiichi Nishimura more than expected).

Fields of papers citing papers by Eiichi Nishimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eiichi Nishimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eiichi Nishimura. The network helps show where Eiichi Nishimura may publish in the future.

Co-authors

The 25 scholars most cited alongside Eiichi Nishimura, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Eiichi Nishimura Line = papers co-authored together Eiichi Nishimura links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 65 papers — load more, or switch the sort, to bring in the rest.

#Work
1 201247
2 198933
3 201329
4 200624
5 201323
6 199422
7 200321
8 201519
9 201317
10 198316
11 199515
12 201015
13 201215
14 199515
15 201414
16 199514
17 198513
18 201313
19 201012
20 199411

About Eiichi Nishimura

Eiichi Nishimura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Materials Chemistry, having authored 65 papers that have together received 560 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (16 papers), Particle Accelerators and Free-Electron Lasers (10 papers), Semiconductor materials and devices (9 papers), Advanced Surface Polishing Techniques (7 papers), Particle accelerators and beam dynamics (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Copper Interconnects and Reliability (6 papers) and Nanofabrication and Lithography Techniques (5 papers). The work is most often cited by research in Ophthalmology (66 citations), Surfaces, Coatings and Films (54 citations), Electrical and Electronic Engineering (321 citations), Urology (28 citations) and Electronic, Optical and Magnetic Materials (66 citations). Eiichi Nishimura has collaborated with scholars based in Japan, United States and Belgium. Frequent co-authors include Koji Kobayashi, N. Morita, Naoya Kumagai, Shigeo Yaguchi, Shinji Suganomata, Yukinori Saito, Seiji Nagahara, T. Tomimasu, Mark Somervell and Takahiro Kitano. Their work appears in journals such as Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, Japanese Journal of Applied Physics, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Journal of Cataract & Refractive Surgery and Journal of Investigative Dermatology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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