C. Vallée

12.3k citations
131 papers · 3.0k · h-index 31

Impact in

    • Semiconductor materials and devices
    • Advanced Memory and Neural Computing
    • Ferroelectric and Negative Capacitance Devices
    • Plasma Diagnostics and Applications
    • Electronic and Structural Properties of Oxides
    • Phase-change materials and chalcogenides
    • Diamond and Carbon-based Materials Research

Papers in

    • Semiconductor materials and devices 71
    • Ferroelectric and Negative Capacitance Devices 32
    • Advanced Memory and Neural Computing 31
    • Plasma Diagnostics and Applications 14
    • Electronic and Structural Properties of Oxides 15
    • ZnO doping and properties 14

C. Vallée

127 papers receiving 2.9k citations

Peers

C. Vallée
Comparison fields: 5 of 85
  • Electrical and Electronic Engineering 2.1k
  • Materials Chemistry 1.5k
  • Electronic, Optical and Magnetic Materials 403
  • Surfaces, Coatings and Films 126
  • Polymers and Plastics 212
Replace Rebecca Cheung with:
Rebecca Cheung United Kingdom
Bernd Szyszka Germany
C.R.M. Grovenor United Kingdom
Reiner Mönig Germany
Rolf E. Hummel United States
S. Mohan India
L. M. Kukreja India
C. M. Gilmore United States
Yoosuf N. Picard United States
S. Leppävuori Finland
C. Vallée relative to Rebecca Cheung United Kingdom Rebecca Cheung's profile →
Citations per field
00.5×1.7×
Rebecca Cheung · 1×
Citations per year

Countries citing papers authored by C. Vallée

Since Specialization
Citations

This map shows the geographic impact of C. Vallée's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Vallée with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Vallée more than expected).

Fields of papers citing papers by C. Vallée

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Vallée. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Vallée. The network helps show where C. Vallée may publish in the future.

Co-authors

The 25 scholars most cited alongside C. Vallée, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Vallée Line = papers co-authored together C. Vallée links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 131 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2017243
2 2000122
3 2010111
4 199788
5 201383
6 200780
7 201065
8 200461
9 201260
10 201658
11 200057
12 199951
13 200050
14 200948
15 200747
16 202046
17 199946
18 201644
19 201244
20 201840

About C. Vallée

C. Vallée is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Mechanics of Materials and Biomedical Engineering, having authored 131 papers that have together received 3.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (71 papers), Ferroelectric and Negative Capacitance Devices (32 papers), Advanced Memory and Neural Computing (31 papers), Metal and Thin Film Mechanics (20 papers), Copper Interconnects and Reliability (16 papers), Electronic and Structural Properties of Oxides (15 papers), Plasma Diagnostics and Applications (14 papers) and ZnO doping and properties (14 papers). The work is most often cited by research in Electrical and Electronic Engineering (2.1k citations), Materials Chemistry (1.5k citations), Electronic, Optical and Magnetic Materials (403 citations), Surfaces, Coatings and Films (126 citations) and Polymers and Plastics (212 citations). C. Vallée has collaborated with scholars based in France, Germany and Tunisia. Frequent co-authors include P. Gonon, A. Goullet, A. Granier, G. Turban, Thomas Höhne, F. El Kamel, Pierre Noé, Jean‐Yves Raty, F. Fillot and F. Hippert. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, Applied Physics Letters, Nuclear Engineering and Design and Thin Solid Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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